Scanning tunneling microscopy study of the initial reaction of SiH2Cl2 molecules with the Si(111)-7x7 surface

被引：4

作者：

Komura, T

Okano, S

Morikawa, K

Hanada, T

Yoshimura, M

Yao, T

机构：

[1] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 980, Japan

[2] Toyota Technol Inst, Tempaku Ku, Nagoya, Aichi 468, Japan

来源：

APPLIED SURFACE SCIENCE | 1998年 / 130卷

关键词：

scanning tunneling microscopy; silicon; dichlorosilane; initial reaction; preferential adsorption site; dissociative adsorption;

D O I：

10.1016/S0169-4332(98)00019-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The initial stage of the reaction of dichlorosilane (SiH(2)Cl(2)) with the Si(111)-(7 X 7) surface under exposure below 1 L is investigated using a scanning tunneling microscope (STM). We found that corner adatoms are preferentially reacted over the center adatoms at the very beginning of exposure. The initial reaction process of SiH(2)Cl(2) with Si(111)-(7 x 7) surface is discussed. It is suggested that the preferential reactivity of a corner-hole atom is reduced as the exposure increases, which may give rise to reacted rest atoms. (C) 1998 Elsevier Science B.V. All rights reserved.

引用

页码：23 / 28

页数：6

共 13 条

[1] PROBING AND INDUCING SURFACE-CHEMISTRY WITH THE STM - THE REACTIONS OF SI(111)-7X7 WITH H2O AND O2 [J].