Synthesis of multiple single crystal diamonds by DC-GD-CVD

被引:5
作者
Lyu, Ji-lei [1 ]
Wang, Shao-long [1 ]
Wang, Bo [1 ]
Nishimura, Kazhihito [2 ]
Jiang, Nan [1 ]
机构
[1] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Zhejiang Key Lab Marine Mat & Protect Technol, Key Lab Marine New Mat & Related Technol, Ningbo 315201, Zhejiang, Peoples R China
[2] Kogakuin Univ, Mech Syst Engn, Tokyo, Japan
关键词
Single crystal diamond; chemical vapour deposition; hardness; crystal growth; GROWTH; FABRICATION; DEPOSITION; FILMS; SUBSTRATE;
D O I
10.1080/02670844.2018.1447270
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Multiple single crystal diamonds (SCDs) were first synthesised on 24 high pressure high temperature (HPHT) synthetic type Ib (100) SCD seeds by direct current glow discharge plasma chemical vapour deposition (DC-GD-CVD) system with gas mixture of CH4-H-2-Ar. Owing to the increase of the formed plasma density and temperature caused by the addition of 1.2 vol.-% Ar gas, a high growth rate of 22.2 mu m h(-1) for diamonds deposition was achieved by the plasma with diameter of 2 inches at 900-950 degrees C. After deposition for 50 h, diamond material with a thickness of about 1 mm was uniformly deposited on each seed. The average FWHM value, hardness and transmittance of as-obtained SCDs were 3.2 cm(-1), 105 GPa and 69.4%, revealing the high quality of multiple SCDs fabricated by the DC-GD-CVD method.
引用
收藏
页码:91 / 95
页数:5
相关论文
共 22 条
[1]   Diamond films grown without seeding treatment and bias by hot-filament CVD system [J].
Ali, M. ;
Urgen, M. .
SOLID STATE SCIENCES, 2012, 14 (04) :540-544
[2]   Multiple substrate microwave plasma-assisted chemical vapor deposition single crystal diamond synthesis [J].
Asmussen, J. ;
Grotjohn, T. A. ;
Schuelke, T. ;
Becker, M. F. ;
Yaran, M. K. ;
King, D. J. ;
Wicklein, S. ;
Reinhard, D. K. .
APPLIED PHYSICS LETTERS, 2008, 93 (03)
[3]  
Chen J, 2017, APPL PHYS LETT, V110
[4]   Optical, thermal and mechanical properties of CVD diamond [J].
Coe, SE ;
Sussmann, RS .
DIAMOND AND RELATED MATERIALS, 2000, 9 (9-10) :1726-1729
[5]   A sequential Raman analysis of the growth of diamond films on silicon substrates in a microwave plasma assisted chemical vapor deposition reactor [J].
Fayette, L ;
Marcus, B ;
Mermoux, M ;
Rosman, N ;
Abello, L ;
Lucazeau, G .
JOURNAL OF MATERIALS RESEARCH, 1997, 12 (10) :2686-2698
[6]   Interface features of the HPHT Ib substrate and homoepitaxial CVD diamond layer [J].
Hei, L. F. ;
Zhao, Y. ;
Wei, J. J. ;
Liu, J. L. ;
Li, C. M. ;
Tang, W. Z. ;
Lu, F. X. .
DIAMOND AND RELATED MATERIALS, 2016, 69 :33-39
[7]   Fabrication and characterizations of large homoepitaxial single crystal diamond grown by DC arc plasma jet: CVD [J].
Hei, L. F. ;
Liu, J. ;
Li, C. M. ;
Song, J. H. ;
Tang, W. Z. ;
Lu, F. X. .
DIAMOND AND RELATED MATERIALS, 2012, 30 :77-84
[8]   Microstructure and stress in nano-crystalline diamond films deposited by DC glow discharge CVD [J].
Heiman, A ;
Lakin, E ;
Zolotoyabko, E ;
Hoffman, A .
DIAMOND AND RELATED MATERIALS, 2002, 11 (3-6) :601-607
[9]   A study on surface morphologies of (001) homoepitaxial diamond films [J].
Lee, NS ;
Badzian, A .
DIAMOND AND RELATED MATERIALS, 1997, 6 (01) :130-145
[10]  
Liang Q, 2009, J PHYS CONDENS MATT, V21, P1