Liquid phase epitaxial growth of SiC

被引:59
|
作者
Syväjärvi, M
Yakimova, R
Radamson, HH
Son, NT
Wahab, Q
Ivanov, IG
Janzén, E
机构
[1] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
[2] Outokumpu Semitron, S-17824 Ekero, Sweden
关键词
SiC; liquid phase; growth; purity;
D O I
10.1016/S0022-0248(98)00878-1
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The characteristics of 4H and 6H-SiC epitaxial growth from the liquid phase by using a sandwich configuration are presented. The preparation procedure of the two-component solvent and the growth technique are described. Growth rates exceeding 300 mu m/h have been obtained. The transport of solute is affected by formation of complexes within the liquid zone which decrease the growth rate. The growth rate depends mainly on the temperature gradient but is also influenced by the solvent composition. Important growth parameters such as temperature gradient and substrate off-orientation have a profound influence on the morphological stability. It is shown that if these are not properly chosen, constitutional supercooling may appear. The polytype of the substrate is reproduced in the grown material and the structural quality is good. Common defects are discussed. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:147 / 154
页数:8
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