The preferential formation site of dislocations in InAs/GaAs quantum dots

被引:4
作者
Zhou, Shuai [1 ]
Liu, Yumin [1 ]
Wang, Donglin [1 ]
Xin, Xia [1 ]
Cao, Gui [1 ]
Lu, Pengfei [1 ]
Yu, Zhongyuan [1 ]
机构
[1] Beijing Univ Posts & Telecommun, Inst Informat Photon & Opt Commun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China
基金
中国国家自然科学基金; 国家高技术研究发展计划(863计划);
关键词
InAs/GaAs quantum dots; Dislocation; Position dependent; Aspect ratio; LASERS; ISLANDS; GROWTH; MISFIT;
D O I
10.1016/j.spmi.2011.10.004
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this paper, taking elastic anisotropy into consideration, we use a dislocation position dependent model to calculate the preferential formation site of the pure edge and 60 degrees mixed dislocation segment in different shaped InAs/GaAs quantum dots (QDs). From the result, it is clear that for the pure edge dislocations the most energy favorable position is always the base center of the quantum dots. While as to the 60 degrees mixed dislocations, the positions near to the edge of the quantum dot base are the energy favorable area and the exact position is changed with different aspect ratio of the quantum dot. (C) 2011 Published by Elsevier Ltd.
引用
收藏
页码:53 / 61
页数:9
相关论文
共 25 条
[1]   BREAKDOWN OF CONTINUUM ELASTICITY THEORY IN THE LIMIT OF MONATOMIC FILMS [J].
BRANDT, O ;
PLOOG, K ;
BIERWOLF, R ;
HOHENSTEIN, M .
PHYSICAL REVIEW LETTERS, 1992, 68 (09) :1339-1342
[2]   A non-singular continuum theory of dislocations [J].
Cai, W ;
Arsenlis, A ;
Weinberger, CR ;
Bulatov, VV .
JOURNAL OF THE MECHANICS AND PHYSICS OF SOLIDS, 2006, 54 (03) :561-587
[3]   STRAIN INDUCED 2D-3D GROWTH MODE TRANSITION IN MOLECULAR-BEAM EPITAXY OF INXGA1-XAS ON GAAS (001) [J].
CESCHIN, AM ;
MASSIES, J .
JOURNAL OF CRYSTAL GROWTH, 1991, 114 (04) :693-699
[4]   MECHANISMS OF STRAINED ISLAND FORMATION IN MOLECULAR-BEAM EPITAXY OF INAS ON GAAS(100) [J].
CHEN, P ;
XIE, Q ;
MADHUKAR, A ;
CHEN, L ;
KONKAR, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (04) :2568-2573
[5]   REDUCED EFFECTIVE MISFIT IN LATERALLY LIMITED STRUCTURES SUCH AS EPITAXIAL ISLANDS [J].
CHRISTIANSEN, S ;
ALBRECHT, M ;
STRUNK, HP ;
HANSSON, PO ;
BAUSER, E .
APPLIED PHYSICS LETTERS, 1995, 66 (05) :574-576
[6]   STRAINED STATE OF GE(SI) ISLANDS ON SI - FINITE-ELEMENT CALCULATIONS AND COMPARISON TO CONVERGENT-BEAM ELECTRON-DIFFRACTION MEASUREMENTS [J].
CHRISTIANSEN, S ;
ALBRECHT, M ;
STRUNK, HP ;
MAIER, HJ .
APPLIED PHYSICS LETTERS, 1994, 64 (26) :3617-3619
[7]   Molecular-beam epitaxy of InSb/GaSb quantum dots [J].
Deguffroy, N. ;
Tasco, V. ;
Baranov, A. N. ;
Tournie, E. ;
Satpati, B. ;
Trampert, A. ;
Dunaevskii, M. S. ;
Titkov, A. ;
Ramonda, M. .
JOURNAL OF APPLIED PHYSICS, 2007, 101 (12)
[8]   DISLOCATION-FREE STRANSKI-KRASTANOW GROWTH OF GE ON SI(100) [J].
EAGLESHAM, DJ ;
CERULLO, M .
PHYSICAL REVIEW LETTERS, 1990, 64 (16) :1943-1946
[9]   Modeling the plastic relaxation onset in realistic SiGe islands on Si(001) [J].
Gatti, R. ;
Marzegalli, A. ;
Zinovyev, V. A. ;
Montalenti, F. ;
Miglio, Leo .
PHYSICAL REVIEW B, 2008, 78 (18)
[10]  
Glas F., 1987, Microscopy of Semiconducting Materials, 1987. Proceedings of the Institute of Physics Conference, P71