Synthesis of Binary Polymer Brushes via Two-Step Reverse Atom Transfer Radical Polymerization

被引:47
|
作者
Ye, Penglin [1 ]
Dong, Hongchen [1 ]
Zhong, Mingjiang [1 ]
Matyjaszewski, Krzysztof [1 ]
机构
[1] Carnegie Mellon Univ, Dept Chem, Ctr Macromol Engn, Pittsburgh, PA 15213 USA
基金
美国国家科学基金会; 美国安德鲁·梅隆基金会;
关键词
POLY(METHYL METHACRYLATE)/POLYSTYRENE BRUSHES; ELECTRON-TRANSFER; BLOCK-COPOLYMERS; REORGANIZATION; HOMOPOLYMERS; SURFACES;
D O I
10.1021/ma1028533
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Well-defined poly(n-butyl acrylate) (PnBA)/poly(acrylic acid) (PAA) binary brushes grafted from silicon surfaces have been successfully prepared via a two-step reverse atom transfer radical polymerization (reverse ATRP) of n-butyl acrylate and tert-butyl acrylate initiated from tethered diazo groups and subsequent hydrolysis of poly(tert-butyl acrylate) (PtBA). The final molar ratio of PnBA/PAA brushes was well-controlled by limiting the time allowed for the initial decomposition of a fraction of the diazo-initiator at higher temperature. After initiating growth of polymer chains from the surface-tethered initiator and deactivation by the Cu(II) complex, ATRP was carried out at 40 degrees C to achieve desired molecular weight while preventing further decomposition of the remaining unreacted diazo-initiator from which the PtBA brushes were grown in the second step. Measurement of film thickness, contact angle, and surface morphology of the resulting surfaces confirmed the PnBA/PAA binary brush structures and demonstrated how surface properties changed with composition. The morphologies of the surfaces were affected by treatment with a selective solvent, such as water or toluene, and a nonselective solvent, chloroform/methanol (1:1 by volume).
引用
收藏
页码:2253 / 2260
页数:8
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