Photosensitivity of single silicon high-aspect-ratio tips with different doping levels

被引:0
|
作者
Serbun, P. [1 ]
Porshyn, V. [1 ]
Luetzenkirchen-Hecht, D. [1 ]
Prommesberger, C. [2 ]
Langer, C. [2 ]
Lawrowski, R. [2 ]
Schreiner, R. [2 ]
机构
[1] Univ Wuppertal, Sch Math & Nat Sci, D-42119 Wuppertal, Germany
[2] OTH Regensburg, Fac Gen Sci & Microsyst Technol, D-93051 Regensburg, Germany
来源
2018 31ST INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) | 2018年
关键词
field emission; Si p/n junction; p-type Si; photosensitivity;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Photosensitivity of single lightly p-doped, highly p-doped, with an integrated p/n junction and intrinsic high-aspect-ratio (HAR) silicon tips was investigated in an ultra-high vacuum environment. The current-voltage characteristics (I-V) of the lightly doped p-type HAR tips showed a characteristic current saturation at around 10-12 nA, whereas the HAR Si tips with p/n junction showed similar saturation phenomena, however, at much smaller current values starting at similar to 20-30 pA. Optical switching under a halogen lamp illumination resulted in at least 2-4 times higher saturation currents and showed a linear dependence between the illumination power and the FE current, for both types of structures. In case of the highly p-doped HAR tips optical current switching effects, i. e. current saturation, were observed at rather low current levels 1-2 pA. Intrinsic HAR Si-tips showed relative unstable field emission behavior without a clear evidence of the photosensitivity.
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页数:2
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