Energy landscape of silicon tetra-interstitials using an optimized classical potential

被引:25
作者
Du, Yaojun A. [1 ]
Lenosky, Thomas J.
Hennig, Richard G. [2 ]
Goedecker, Stefan [3 ]
Wilkins, John W. [4 ]
机构
[1] Ruhr Univ Bochum, ICAMS, D-44780 Bochum, Germany
[2] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA
[3] Univ Basel, Dept Phys & Astron, Basel, Switzerland
[4] Ohio State Univ, Dept Phys, Columbus, OH 43210 USA
来源
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 2011年 / 248卷 / 09期
基金
美国国家科学基金会;
关键词
defects; embedded atom model; interatomic potentials; interstitials; ion implantation; silicon; 1ST-PRINCIPLES CALCULATIONS; SI; DIFFUSION; DYNAMICS; ELECTRON; DEFECTS; PSEUDOPOTENTIALS; EVOLUTION; CLUSTERS; MODEL;
D O I
10.1002/pssb.201147137
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Mobile single interstitials can grow into extended interstitial defect structures during thermal anneals following ion implantation. The silicon tetra-interstitials present an important intermediate structure that can either provide a chain-like nucleation site for extended structures or form a highly stable compact interstitial cluster preventing further growth. In this paper, dimer searches using the tight-binding (TB) model by Lenosky et al. and density functional calculations show that the compact ground-state I-4(a) and the I-4-chain are surrounded by high-lying neighboring local minima. To furthermore explore the phase space of tetra-interstitial structures an empirical potential is optimized to a database of silicon defect structures. The minima hopping method combined with this potential extensively searches the energy landscape of tetra-interstitials and discovers several new lowenergy I-4 structures. The second lowest-energy I-4 structure turns out to be a distorted ground-state tri-interstitial bound with a single interstitial, which confirms that the ground-state tri-interstitial may serve as a nucleation center for the extended defects in silicon.
引用
收藏
页码:2050 / 2055
页数:6
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