Investigations on the crystallisation properties of RF magnetron sputtered indium tin oxide thin films

被引:97
|
作者
Thilakan, P [1 ]
Minarini, C [1 ]
Loreti, S [1 ]
Terzini, E [1 ]
机构
[1] ENEA, Ctr Ric, I-80055 Portici, NA, Italy
关键词
indium tin oxide; thin film deposition; RF magnetron sputtering; crystal growth; X-ray diffraction; X-ray texture; characterization;
D O I
10.1016/S0040-6090(01)00820-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
X-Ray diffraction and X-ray texture analysis have been carried out on RF magnetron sputtered ITO (indium tin oxide) thin films on glass substrates in order to understand their crystal growth behaviour. Films deposited at various deposition rates and gas compositions were subjected to investigation. X-Ra; diffraction analysis revealed the polycrystalline structure of the films with a difference in crystallographic orientation without any change in the BCC (Body Centred Cubic) structure. Both the increase in deposition rate and gas composition reflects the change in crystallographic orientation. X-Ray texture analysis on the grown films revealed also a difference in film texturization following the change in crystallographic orientation. Strong orientation of crystallites perpendicular to the substrate were observed for films grown with (400) preferential plane. (C) 2001 Elsevier Science B.V. Ail rights reserved.
引用
收藏
页码:34 / 40
页数:7
相关论文
共 50 条
  • [41] Study of the effect of the oxygen partial pressure on the properties of rf reactive magnetron sputtered tin-doped indium oxide films
    Meng, LJ
    dos Santos, MP
    APPLIED SURFACE SCIENCE, 1997, 120 (3-4) : 243 - 249
  • [42] Oxygen Induced Limitation on Grain Growth in RF Sputtered Indium Tin Oxide Thin Films
    Lamsal, Buddhi Sagar
    Huh, Yung
    Dubey, Mukul
    Manoj, K. C.
    Venkatesan, Swaminathan
    Qiao, Qiquan
    Galipeau, David
    Fan, Qi Hua
    2013 IEEE INTERNATIONAL CONFERENCE ON ELECTRO-INFORMATION TECHNOLOGY (EIT 2013), 2013,
  • [43] Thickness Dependence of Indium-Tin Oxide Thin Films Deposited by RF Magnetron Sputtering
    Damiani, L. R.
    Mansano, R. D.
    MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2010, 2010, 31 (01): : 117 - 124
  • [44] Properties of dc magnetron sputtered indium tin oxide films on polymeric substrates at room temperature
    Shin, JH
    Shin, SH
    Park, JI
    Kim, HH
    JOURNAL OF APPLIED PHYSICS, 2001, 89 (09) : 5199 - 5203
  • [45] PREPARATION AND CHARACTERIZATION OF RF SPUTTERED INDIUM TIN OXIDE-FILMS
    SREENIVAS, K
    RAO, TS
    MANSINGH, A
    CHANDRA, S
    JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) : 384 - 392
  • [46] Elemental distribution and oxygen deficiency of magnetron sputtered indium tin oxide films
    Thogersen, Annett
    Rein, Margrethe
    Monakhov, Edouard
    Mayandi, Jeyanthinath
    Diplas, Spyros
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (11)
  • [47] Effect of Hydrogen Addition on Bulk Properties of Sputtered Indium Tin Oxide Thin Films
    Juneja, Nimish
    Tutsch, Leonard
    Feldmann, Frank
    Fischer, Andreas
    Bivour, Martin
    Moldovan, Anamaria
    Hermle, Martin
    9TH INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS (SILICONPV 2019), 2019, 2147
  • [48] Structural, optical, and electrical properties of RF-sputtered indium oxide thin films
    Cho, Shinho
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2012, 60 (12) : 2058 - 2062
  • [49] Structural, optical, and electrical properties of RF-sputtered indium oxide thin films
    Shinho Cho
    Journal of the Korean Physical Society, 2012, 60 : 2058 - 2062
  • [50] OPTICAL AND ELECTRICAL-PROPERTIES OF RF-SPUTTERED INDIUM TIN OXIDE-FILMS
    SZCZYRBOWSKI, J
    DIETRICH, A
    HOFFMANN, H
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 78 (01): : 243 - 252