Properties of boron carbide thin films deposited by pulsed laser deposition

被引:11
|
作者
Jahn, Falko [1 ]
Weissmantel, Steffen [1 ]
机构
[1] Univ Appl Sci Mittweida, Technikumpl 17, D-09648 Mittweida, Germany
来源
关键词
Pulsed laser deposition; PLD; Substrate temperature; Boron carbide; B4C; Super-hard coatings; CHEMICAL-VAPOR-DEPOSITION; ROOM-TEMPERATURE; MICROSTRUCTURE; HARDNESS; FLUENCE; ABLATION; TARGET;
D O I
10.1016/j.surfcoat.2021.127480
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Boron carbide (B4C) is the third hardest material known after diamond or ta-C and cubic boron nitride (c-BN). Due to its super-hardness and, moreover, its stability up to high temperatures and chemical stability against ferrous materials, it is an interesting material for use as wear resistant coatings, particularly in applications where diamond or ta-C films are not possible to use. Super-hard boron carbide coatings were produced using Pulsed Laser Deposition (PLD) and their mechanical properties were investigated in dependence of the laser fluence and the substrate temperature during deposition. While substrate temperature was found to have a significant influence on the hardness of the coatings, the influence of the ablation fluence was insignificant. At all fluences used, the indentation hardness increases from some 31 GPa at mom temperature up to 47 GPa at 500 degrees C. The Young's modulus was measured to be in the range of 470 to 600 GPa. The films show good adhesion on tungsten carbide but a poorer adhesion on cold working steel. The surface quality, however, was poor at film thicknesses sufficient for practical applications due to the incorporation of many droplets. In order to improve this, an approach was made using an alternative boron carbide target the results of which also are presented. The target was produced by depositing a several ten microns thick boron carbide film on a steel substrate using PLD. The films deposited using this target were found to have much less and much smaller droplets.
引用
收藏
页数:8
相关论文
共 50 条
  • [41] Ferroelectric and ferromagnetic properties of BiFeO3 thin films deposited by pulsed laser deposition
    Yun, KY
    Noda, M
    Okuyama, M
    Saeki, H
    Tabata, H
    FERROELECTRIC THIN FILMS XII, 2004, 784 : 293 - 298
  • [42] Structural and Optical Properties of Epitaxial Iron Oxide Thin Films Deposited by Pulsed Laser Deposition
    Jin Eun Heo
    Taeyang Choi
    Seo Hyoung Chang
    Jung Hyeon Jeong
    Byung Chun Choi
    Jae Won Jang
    Journal of the Korean Physical Society, 2020, 76 : 512 - 516
  • [43] Structural and optical properties of ZnO thin films deposited on quartz glass by pulsed laser deposition
    Zhao, Lei
    Lian, Jianshe
    Liu, Yuhua
    Jiang, Qing
    APPLIED SURFACE SCIENCE, 2006, 252 (24) : 8451 - 8455
  • [44] Nanomechanical properties of GaSe thin films deposited on Si(111) substrates by pulsed laser deposition
    Jian, Sheng-Rui
    Juang, Jenh-Yih
    Luo, Chih-Wei
    Ku, Shin-An
    Wu, Kaung-Hsiung
    JOURNAL OF ALLOYS AND COMPOUNDS, 2012, 542 : 124 - 127
  • [45] Structure and properties of TiC, VC and TiC/VC thin films deposited by pulsed laser deposition
    Krzanowski, JE
    Leuchtner, RE
    COVALENT CERAMICS III - SCIENCE AND TECHNOLOGY OF NON-OXIDES, 1996, 410 : 301 - 306
  • [46] On the electrochromic properties of antimony-tin oxide thin films deposited by pulsed laser deposition
    Naghavi, N
    Marcel, C
    Dupont, L
    Leriche, JB
    Tarascon, JM
    SOLID STATE IONICS, 2003, 156 (03) : 463 - 474
  • [47] Characterization and Electrical Properties of TiO2 Thin Films Deposited by Pulsed Laser Deposition
    Badar, Nurhanna
    Kamarulzaman, Norlida
    INTERNATIONAL CONGRESS ON ADVANCES IN APPLIED PHYSICS AND MATERIALS SCIENCE, 2011, 1400 : 291 - 296
  • [48] Study of the structure and electrical properties of the copper nitride thin films deposited by pulsed laser deposition
    Gallardo-Vega, C.
    de la Cruz, W.
    APPLIED SURFACE SCIENCE, 2006, 252 (22) : 8001 - 8004
  • [49] The effects of boron content in the target of pulsed laser deposition on the properties of boron doped amorphous carbon thin films
    Rusop, M
    Tian, XM
    Kinugawa, T
    Soga, T
    Jimbo, T
    Umeno, M
    MODERN PHYSICS LETTERS B, 2004, 18 (26-27): : 1379 - 1393
  • [50] Properties of boron-carbon-nitrogen ternary thin films synthesized by pulsed laser deposition
    Ren, ZM
    Lu, YF
    Mai, ZH
    Cheong, BA
    Chow, SK
    Wang, JP
    Chong, TC
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING IV, 1999, 3618 : 520 - 528