X-ray wavefront analysis and optics characterization with a grating interferometer -: art. no. 054101

被引：156

作者：

Weitkamp, T ^{[1
]}

Nöhammer, B

Diaz, A

David, C

Ziegler, E

机构：

[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, Villigen, Switzerland

[2] European Synchrotron Radiat Facil, Expt Div, Grenoble, France

来源：

APPLIED PHYSICS LETTERS | 2005年 / 86卷 / 05期

关键词：

D O I：

10.1063/1.1857066

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present an interferometric method to measure the shape of a hard-x-ray wavefront. The interferometer consists of a phase grating as a beam splitter and an absorption grating as a transmission mask for the detector. The device can be used to measure wavefront shape gradients corresponding to radii of curvature as large as several dozens of meters, with a lateral resolution of a few microns. This corresponds to detected wavefront distortions of approximately 10-(12) M or lambda/100. The device was used with 12.4 keV x rays to measure the slope error and height profile of an x-ray mirror. Surface slope variations with periods ranging from less than I mm to more than I m can be detected with an accuracy better than 0.1 murad. (C) 2005 American Institute of Physics.

引用

页码：1 / 3

页数：3

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