Mirror-Symmetric Patterning of Topological Insulator Reverses Photogalvanic Currents

被引：0

作者：

Sun, Xinxing ^{[1
]}

Adamo, Giorgio ^{[1
]}

Eginligil, Mustafa ^{[2
,5
]}

Krishnamoorthy, Harish N. S. ^{[1
]}

Zheludev, Nikolay, I ^{[1
,2
,3
,4
]}

Soci, Cesare ^{[1
,2
]}

机构：

[1] Nanyang Technol Univ, Ctr Disrupt Photon Technol, SPMS, TPI, Singapore 637371, Singapore

[2] Nanyang Technol Univ, Div Phys & Appl Phys, Singapore 637371, Singapore

[3] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England

[4] Univ Southampton, Ctr Photon Metamat, Southampton SO17 1BJ, Hants, England

[5] Nanjing Tech Univ Nanjing Tech, 30 South Puzhu Rd, Nanjing 211816, Peoples R China

来源：

2021 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2021年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Patterning of topological insulator with mirror-symmetric forms of planar chiral design yields photogalvanic currents with opposite directions due to the interplay between the spin-momentum locking and polarization conversion in the pattern. (c) 2021 The Author(s)

引用

页数：2