Bismuth titanate, Bi4Ti3O12 (BiT), is a complex layered ferroelectric material that is composed of three perovskitelike units and one fluoritelike unit stacked alternatively along the transverse direction. The ground-state crystal structure is monoclinic with the spontaneous polarization (similar to 50 mu C/cm(2)) along the plane. BiT typically grows along the c direction in thin-film form, and having the polarization vector aligned with the growth orientation can be beneficial for several potential device applications. It is well known that judicious doping of ferroelectrics is an effective method in adjusting the magnitude and the orientation of the spontaneous polarization. Here, we show using first-principles density-functional theory and a detailed phonon analysis that Bi atoms in the fluoritelike layers have significantly more impact on the magnitude and orientation of the spontaneous polarization vector as compared to the perovskitelike layer. The low-energy hard-phonon modes are characterized by fluoritelike layers experiencing transverse displacements and large changes in Born effective charges on Bi atoms. Thus, the breaking of symmetry caused by doping of Bi sites within the fluoritelike layer leads to the formation of uncancelled permanent dipole moments along the transverse direction. This provides an opportunity for doping the Bi site in the fluoritelike layer. Isovalent dopants P, As, and Sb were studied. P is found to be most effective in the reorientation of the spontaneous polarization. It leads to a threefold enhancement of the out-of-plane component of polarization and to a commensurate rotation of the spontaneous polarization vector by 36.2 degrees towards the transverse direction.
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Ioffe Inst, Ul Politechnicheskaya 26, St Petersburg 194021, RussiaIoffe Inst, Ul Politechnicheskaya 26, St Petersburg 194021, Russia
Lomanova, N. A.
Tomkovich, M. V.
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Ioffe Inst, Ul Politechnicheskaya 26, St Petersburg 194021, RussiaIoffe Inst, Ul Politechnicheskaya 26, St Petersburg 194021, Russia
Tomkovich, M. V.
Ugolkov, V. L.
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Russian Acad Sci, Grebenshchikov Inst Silicate Chem, Ul Tiflisskaya 3-6, St Petersburg 199034, RussiaIoffe Inst, Ul Politechnicheskaya 26, St Petersburg 194021, Russia
Ugolkov, V. L.
Gusarov, V. V.
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Ioffe Inst, Ul Politechnicheskaya 26, St Petersburg 194021, RussiaIoffe Inst, Ul Politechnicheskaya 26, St Petersburg 194021, Russia
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Indian Inst Technol, Dept Mat & Met Engn, Kanpur 208016, Uttar Pradesh, IndiaIndian Inst Technol, Dept Mat & Met Engn, Kanpur 208016, Uttar Pradesh, India
Garg, A
Hu, X
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机构:Indian Inst Technol, Dept Mat & Met Engn, Kanpur 208016, Uttar Pradesh, India
Hu, X
Barber, ZH
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机构:Indian Inst Technol, Dept Mat & Met Engn, Kanpur 208016, Uttar Pradesh, India
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Xian Univ Technol, Dept Mat Phys & Chem, Xian 710048, Peoples R ChinaXian Univ Technol, Dept Mat Phys & Chem, Xian 710048, Peoples R China
Chen, Yuanqing
Zhao, Gaoyang
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Xian Univ Technol, Dept Mat Phys & Chem, Xian 710048, Peoples R ChinaXian Univ Technol, Dept Mat Phys & Chem, Xian 710048, Peoples R China
Zhao, Gaoyang
Liang, Hongwei
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Xian Univ Technol, Dept Mat Phys & Chem, Xian 710048, Peoples R ChinaXian Univ Technol, Dept Mat Phys & Chem, Xian 710048, Peoples R China
Liang, Hongwei
Xia, Weiming
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Xi An Jiao Tong Univ, Minist Educ, Key Lab, Elect Mat Res Lab, Xian 710049, Peoples R ChinaXian Univ Technol, Dept Mat Phys & Chem, Xian 710048, Peoples R China