Run-to-Run Control for Semiconductor Manufacturing Processes using Extended State Observer

被引：0

作者：

Wang, Haiyan ^{[1
]}

Tan, Fei ^{[1
]}

Sheng, Biqi ^{[1
,2
]}

Bian, Jun ^{[1
]}

Pan, Tianhong ^{[1
]}

机构：

[1] Jiangsu Univ, Sch Elect Informat & Engn, Zhenjiang 2013, Jiangsu, Peoples R China

[2] China Maritime Police Acad, Ningbo 315801, Zhejiang, Peoples R China

来源：

PROCEEDINGS OF THE 28TH CHINESE CONTROL AND DECISION CONFERENCE (2016 CCDC) | 2016年

关键词：

Extended State Observer (ESO); Run-to-run (R2R) control; EWMA; PRODUCT;

D O I：

暂无

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

The state estimation is one of the challenge issues in the semiconductor manufacturing processes, which can improve the Run-to-Run control (R2R). To achieve a good performance on the state estimation, the Extended State Observer (ESO) is integrated into R2R control in this paper. Firstly, the basic principle of ESO is introduced. Then, the disturbances estimation in R2R control is developed using the discrete ESO. Finally, the proposed method is evaluated by numerical examples.

引用

页码：854 / 857

页数：4

共 10 条

[1] Run-to-run control and state estimation in high-mix semiconductor manufacturing
Bode, C. A.
Wang, J.
He, Q. P.
Edgar, T. F.
[J]. ANNUAL REVIEWS IN CONTROL, 2007, 31 (02) : 241 - 253
[2] Run-to-run control and performance monitoring of overlay in semiconductor manufacturing
Bode, CA
Ko, BS
Edgar, TF
[J]. CONTROL ENGINEERING PRACTICE, 2004, 12 (07) : 893 - 900
[3] A G&P EWMA algorithm for high-mix semiconductor manufacturing processes
Chang, Chun-Cheng
Pan, Tian-Hong
Wong, David Shan-Hill
Jang, Shi-Shang
[J]. JOURNAL OF PROCESS CONTROL, 2011, 21 (01) : 28 - 35
[4] Run-to-run process control: Literature review and extensions
DelCastillo, E
Hurwitz, AM
[J]. JOURNAL OF QUALITY TECHNOLOGY, 1997, 29 (02) : 184 - 196
[5] Just-in-time adaptive disturbance estimation for run-to-run control of semiconductor processes
Firth, Stacy K.
Campbell, W. Jarrett
Toprac, Anthony
Edgar, Thomas F.
[J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2006, 19 (03) : 298 - 315
[6] Han J. Q., 2008, ACTIVE DISTURBANCE R, V358
[7] Identification of tool and product effects in a mixed product and parallel tool environment
Ma, Ming-Da
Chang, Chun-Cheng
Wong, David Shan-Hill
Jang, Shi-Shang
[J]. JOURNAL OF PROCESS CONTROL, 2009, 19 (04) : 591 - 603
[8] Observability and state estimation for multiple product control in semiconductor manufacturing
Pasadyn, AJ
Edgar, TE
[J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2005, 18 (04) : 592 - 604
[9] Semiconductor manufacturing process control and monitoring: A fab-wide framework
Qin, SJ
Cherry, G
Good, R
Wang, J
Harrison, CA
[J]. JOURNAL OF PROCESS CONTROL, 2006, 16 (03) : 179 - 191
[10] Tian-Hong P, 2010, CHIN CONTR CONF, P3428

← 1 →