Characterization and stability of thin oxide films on plutonium surfaces

被引:48
作者
Flores, H. G. Garcia [1 ,2 ]
Roussel, P. [3 ]
Moore, D. P. [2 ]
Pugmire, D. L. [1 ,2 ]
机构
[1] Univ Nebraska, Dept Chem, Lincoln, NE 68588 USA
[2] Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USA
[3] Atom Weap Estab, Reading, Berks, England
关键词
XPS; AES; Plutonium; Oxidation; RAY PHOTOELECTRON-SPECTROSCOPY; X-RAY; PHOTOEMISSION; XPS; PU; TEMPERATURE; OXIDATION; DIAGRAM;
D O I
10.1016/j.susc.2010.10.034
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) were employed to study oxide films on plutonium metal surfaces. Measurements of the relative concentrations of oxygen and plutonium, as well as the resulting oxidation states of the plutonium (Pu) species in the near-surface region are presented. The oxide product of the auto-reduction (AR) of plutonium dioxide films is evaluated and found to be an oxide species which is reduced further than what is expected. The results of this study show a much greater than anticipated extent of auto-reduction and challenge the commonly held notion of the stoichiometric stability of Pu2O3 thin-films. The data indicates that a sub-stoichiometric plutonium oxide (Pu2O3-y) exists at the metal-oxide interface. The level of sub-stoichiometry is shown to depend, in part, on the carbidic contamination of the metal surface. Published by Elsevier B.V.
引用
收藏
页码:314 / 320
页数:7
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