Characterization and stability of thin oxide films on plutonium surfaces
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作者:
Flores, H. G. Garcia
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Univ Nebraska, Dept Chem, Lincoln, NE 68588 USA
Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USAUniv Nebraska, Dept Chem, Lincoln, NE 68588 USA
Flores, H. G. Garcia
[1
,2
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Roussel, P.
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Atom Weap Estab, Reading, Berks, EnglandUniv Nebraska, Dept Chem, Lincoln, NE 68588 USA
Roussel, P.
[3
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Moore, D. P.
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Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USAUniv Nebraska, Dept Chem, Lincoln, NE 68588 USA
Moore, D. P.
[2
]
Pugmire, D. L.
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Univ Nebraska, Dept Chem, Lincoln, NE 68588 USA
Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USAUniv Nebraska, Dept Chem, Lincoln, NE 68588 USA
Pugmire, D. L.
[1
,2
]
机构:
[1] Univ Nebraska, Dept Chem, Lincoln, NE 68588 USA
[2] Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USA
X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) were employed to study oxide films on plutonium metal surfaces. Measurements of the relative concentrations of oxygen and plutonium, as well as the resulting oxidation states of the plutonium (Pu) species in the near-surface region are presented. The oxide product of the auto-reduction (AR) of plutonium dioxide films is evaluated and found to be an oxide species which is reduced further than what is expected. The results of this study show a much greater than anticipated extent of auto-reduction and challenge the commonly held notion of the stoichiometric stability of Pu2O3 thin-films. The data indicates that a sub-stoichiometric plutonium oxide (Pu2O3-y) exists at the metal-oxide interface. The level of sub-stoichiometry is shown to depend, in part, on the carbidic contamination of the metal surface. Published by Elsevier B.V.
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Bar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Dept Chem, IL-52900 Ramat Gan, Israel
Bar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Nanomat Res Ctr, IL-52900 Ramat Gan, IsraelBar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Dept Chem, IL-52900 Ramat Gan, Israel
Adadi, Racheli
Zorn, Gilad
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Technion Israel Inst Technol, Fac Mat Engn, IL-32000 Haifa, IsraelBar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Dept Chem, IL-52900 Ramat Gan, Israel
Zorn, Gilad
Brener, Reuven
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Technion Israel Inst Technol, Inst Solid State, IL-32000 Haifa, IsraelBar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Dept Chem, IL-52900 Ramat Gan, Israel
Brener, Reuven
Gotman, Irena
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Technion Israel Inst Technol, Fac Mat Engn, IL-32000 Haifa, IsraelBar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Dept Chem, IL-52900 Ramat Gan, Israel
Gotman, Irena
Gutmanas, Elazar Y.
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Technion Israel Inst Technol, Fac Mat Engn, IL-32000 Haifa, IsraelBar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Dept Chem, IL-52900 Ramat Gan, Israel
Gutmanas, Elazar Y.
Sukenik, Chaim N.
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Bar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Dept Chem, IL-52900 Ramat Gan, Israel
Bar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Nanomat Res Ctr, IL-52900 Ramat Gan, IsraelBar Ilan Univ, Bar Ilan Inst Nanotechnol & Adv Mat, Dept Chem, IL-52900 Ramat Gan, Israel