Effect of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates

被引：23

作者：

Oh, Dohyun ^{[1
,2
]}

No, Young Soo ^{[1
]}

Kim, Su Youn ^{[1
]}

Cho, Woon Jo ^{[2
]}

Kwack, Kae Dal ^{[1
]}

Kim, Tae Whan ^{[1
]}

机构：

[1] Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South Korea

[2] Korea Inst Sci & Technol, Nano Convergence Device Ctr, Seoul 136791, South Korea

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2011年 / 509卷 / 05期

关键词：

Oxide materials; Thin films; Electronic properties; Optical properties; Atomic force microscopy; AFM; X-ray diffraction; PULSED-LASER DEPOSITION; THIN-FILMS; TRANSPARENT; FABRICATION; COATINGS; DIODE;

D O I：

10.1016/j.jallcom.2010.10.180

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Effects of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates were investigated. Atomic force microscopy images showed that Ag films with a thickness of a few nanometers had island structures. X-ray diffraction patterns showed that the phase of the CuAlO2 layer was amorphous. The resistivity of the 40 nm-CuAlO2/18 nm-Ag/40 nm-CuAlO2 multilayer films was 2.8 x 10(-5) Omega cm, and the transmittance of the multilayer films with an Ag film thickness of 8 nm was approximately 89.16%. These results indicate that CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates hold promise for potential applications as transparent conducting electrodes in high-efficiency solar cells. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：2176 / 2179

页数：4

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