Assessment of copper surface coverage with corrosion inhibitor using AFM-based local electrical measurements

被引:3
作者
Szocinski, Michal [1 ]
Darowicki, Kazimierz [1 ]
机构
[1] Gdansk Univ Technol, Fac Chem, Dept Electrochem Corros & Mat Engn, 11-12 G Narutowicza Str, PL-80233 Gdansk, Poland
关键词
Copper; corrosion inhibitor; benzotriazole; AFM; interfaces; local measurements; ATOMIC-FORCE MICROSCOPY; ORGANIC COATINGS; CHLORIDE SOLUTION; IMPEDANCE; BENZOTRIAZOLE; BRASS; TEMPERATURE;
D O I
10.1080/1478422X.2017.1341221
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The paper presents a new method of assessment of metal surface coverage with corrosion inhibitor and thus of inhibitor protective performance. It is based on the atomic force microscopy measurement performed in a contact mode. Apart from topography images the proposed approach allows acquisition of local DC maps and local electrical impedance spectra via application of DC bias voltage or AC perturbation signal between the conductive AFM tip and the substrate. Potentialities of this technique in inhibitor performance monitoring were illustrated on the example of copper/benzotriazole system exposed to elevated humidity environment.
引用
收藏
页码:520 / 525
页数:6
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