Defects in ion implanted Hg0.78Cd0.22Te probed by monoenergetic positron beams

被引:5
作者
Uedono, A [1 ]
Ebe, H
Tanaka, M
Suzuki, R
Ohdaira, T
Tanigawa, S
Mikado, T
Yamamoto, K
Miyamoto, Y
机构
[1] Univ Tsukuba, Inst Mat Sci, Tsukuba, Ibaraki 3058573, Japan
[2] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan
[3] Electrotech Lab, Tsukuba, Ibaraki 3058568, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 07期
关键词
mercury cadmium telluride; ion implantation; defect; vacancy; interstitial; positron annihilation;
D O I
10.1143/JJAP.37.3910
中图分类号
O59 [应用物理学];
学科分类号
摘要
Defects and their annealing properties in ion implanted Hg0.78Cd0.22Te were studied using monoenergetic positron beams. Vacancy-type defects introduced by B+-implantation were identified as open spaces associated with extended defects such as dislocation loops and stacking faults. For an Ar+-implanted specimen, the mean size of the open volume of defects in the damaged region was estimated to be that of divacancies. The observed difference between the species of defects in the B+ and the Ar+-implanted specimens was attributed to the suppression of the recombination between vacancies and interstitials in the damaged region introduced by Ar+-implantation. The annealing temperature of the vacancy-type defects introduced by Ar+-implantation was determined to be 300 degrees C.
引用
收藏
页码:3910 / 3914
页数:5
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