Layer-by-layer epitaxial growth of Mg on GaN(0001)

被引:6
作者
Pezzagna, S. [1 ]
Vezian, S. [1 ]
Brault, J. [1 ]
Massies, J. [1 ]
机构
[1] CNRS, Ctr Rech Heteroepitaxie & Ses Applicat, F-06560 Valbonne, France
关键词
D O I
10.1063/1.2943323
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is shown that Mg deposition at room temperature on a GaN(0001) surface, obtained in situ by molecular beam epitaxy, gives rise to a layer-by-layer epitaxial growth mode. The study by reflection high-energy electron diffraction and scanning tunneling microscopy clearly evidences that a two-dimensional nucleation growth mechanism occurs from the very first Mg monolayer deposited. A complete covering of the GaN surface is obtained from the deposition of the first two monolayers of Mg. (c) 2008 American Institute of Physics.
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页数:3
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