Dependence of crystalline structure and lattice parameters on film thickness in PbTiO3/Pt/MgO epitaxial structure

被引:21
作者
Fujisawa, H [1 ]
Shimizu, M [1 ]
Horiuchi, T [1 ]
Shiosaki, T [1 ]
Matsushige, K [1 ]
机构
[1] KYOTO UNIV,FAC ENGN,DEPT ELECT SCI & ENGN,SAKYO KU,KYOTO 60601,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 9B期
关键词
PbTiO3; epitaxial growth; strain; stress; film thickness; lattice parameter; crystalline structure; X-ray diffraction; total reflection; in-plane;
D O I
10.1143/JJAP.35.4913
中图分类号
O59 [应用物理学];
学科分类号
摘要
In PbTiO3 (2.2-398nm in thickness)/Pt/MgO(100) structure, the dependence of the crystalline structure and lattice parameters of PbTiO3 thin films on the film thickness was investigated using the theta-2 theta XRD method and the energy dispersive typed total reflection X-ray diffraction method (ED-TXRD). By using the ED-TXRD method, we can easily evaluate the in-plane structure of island-structured PbTiO3 films at the initial growth stage. Although the PbTiO3 thin films were highly c-axis orientated, the formation of some a-domains was observed with increasing thickness. The lattice parameters of the vertical dimension were dependent on the film thickness, unlike those in-plane. From these experimental results, the inner strain occurring in PbTiO3 thin films is discussed.
引用
收藏
页码:4913 / 4918
页数:6
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