Electron emission from nanocrystalline diamond films

被引：12
|
作者：
Gu, CZ [1 ]
Jiang, X
Jin, ZS
Wang, WB
机构：
[1] Jilin Univ, State Key Lab Superhard Mat, Changchun 130023, Peoples R China
[2] Fraunhofer Inst Thin Film & Surface Engn, D-38108 Braunschweig, Germany
[3] Chinese Acad Sci, Changchun Inst Phys, Changchun 130021, Peoples R China
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2001年 / 19卷 / 03期
关键词：
D O I：
10.1116/1.1372919
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The; electron emission properties: of nanocrystalline diamond films were described. The nanometer structured diamond films were deposited by the microwave plasma assistance chemical vapor deposition method via continuous H+ ion bombardment. The grain size of nanocrystalline diamond films can be modified by means of changing the energy of bombarded ions. Scanning electron microscopy and Raman spectroscopy indicated the nanometer structure of the films. The results suggested that low-field electron emission and high emission current can be obtained from the films consisting of nanosized diamond grains. (C) 2001 American Vacuum Society.
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收藏
页码：962 / 964
页数：3
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