Ambient gas dependence of hydrogenated silicon clusters grown in an ion trap

被引:4
作者
Watanabe, MO
Kawashima, N
Kanayama, T
机构
[1] Joint Res Ctr Atom Technol, Angstrom Technol Partnership, Tsukuba, Ibaraki 3050046, Japan
[2] Joint Res Ctr Atom Technol, Natl Inst Adv Interdisciplinary Res, Tsukuba, Ibaraki 3058562, Japan
[3] Electrotech Lab, Tsukuba, Ibaraki 3058568, Japan
关键词
D O I
10.1088/0022-3727/31/18/002
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hydrogenated Si cluster ions have been grown from silane gas under electron irradiation in an ion trap with five different gases, H-2, He, Ne, Ar and Xe, as ambient. The mass spectra of Si6Hx+ always had three peaks corresponding to x = 1, 7 and 13, but their peak heights varied depending on the ionization energy of the ambient gas except that Hp produced an exceptionally large amount of Si6Hx+. This dependence was attributed to the ability of the ambient gas to dissociate SiH4 to form SiH2 reactant, which is essential to the growth of Si6Hx+.
引用
收藏
页码:L63 / L66
页数:4
相关论文
共 24 条
  • [1] Semiconductor clusters, nanocrystals, and quantum dots
    Alivisatos, AP
    [J]. SCIENCE, 1996, 271 (5251) : 933 - 937
  • [2] PROPERTIES OF DEPOSITED SIZE-SELECTED CLUSTERS - REACTIVITY OF DEPOSITED SILICON CLUSTERS
    BOWER, JE
    JARROLD, MF
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1992, 97 (11) : 8312 - 8321
  • [3] Controlled deposition of size-selected silver nanoclusters
    Bromann, K
    Felix, C
    Brune, H
    Harbich, W
    Monot, R
    Buttet, J
    Kern, K
    [J]. SCIENCE, 1996, 274 (5289) : 956 - 958
  • [4] REACTIONS OF HE+, NE+, AND AR+ WITH CH4, C2H6, SIH4, AND SI2H6
    CHATHAM, H
    HILS, D
    ROBERTSON, R
    GALLAGHER, AC
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1983, 79 (03) : 1301 - 1311
  • [5] MELTING IN SEMICONDUCTOR NANOCRYSTALS
    GOLDSTEIN, AN
    ECHER, CM
    ALIVISATOS, AP
    [J]. SCIENCE, 1992, 256 (5062) : 1425 - 1427
  • [6] RAMAN-SPECTRA OF SIZE-SELECTED SILICON CLUSTERS AND COMPARISON WITH CALCULATED STRUCTURES
    HONEA, EC
    OGURA, A
    MURRAY, CA
    RAGHAVACHARI, K
    SPRENGER, WO
    JARROLD, MF
    BROWN, WL
    [J]. NATURE, 1993, 366 (6450) : 42 - 44
  • [7] HOWEING AA, 1994, J APPL PHYS, V75, P1340
  • [8] NANOSURFACE CHEMISTRY ON SIZE-SELECTED SILICON CLUSTERS
    JARROLD, MF
    [J]. SCIENCE, 1991, 252 (5009) : 1085 - 1092
  • [9] ANNEALING OF SILICON CLUSTERS
    JARROLD, MF
    HONEA, EC
    [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1992, 114 (02) : 459 - 464
  • [10] DIRECT KINETIC-STUDIES OF SILICON HYDRIDE RADICALS IN THE GAS-PHASE
    JASINSKI, JM
    BECERRA, R
    WALSH, R
    [J]. CHEMICAL REVIEWS, 1995, 95 (05) : 1203 - 1228