Homoleptic single molecular precursors for the deposition of platinum and palladium chalcogenide thin films

被引:16
|
作者
Musetha, P. L. [1 ]
Revaprasadu, N. [1 ]
Kolawole, G. A. [1 ]
Pullabhotla, Rajasekhar V. S. R. [1 ]
Ramasamy, K. [2 ,3 ]
O'Brien, P. [2 ,3 ]
机构
[1] Univ Zululand, Dept Chem, ZA-3886 Kwa Dlangezwa, South Africa
[2] Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England
[3] Univ Manchester, Ctr Mat Sci, Manchester M13 9PL, Lancs, England
基金
新加坡国家研究基金会;
关键词
Thin films; Chalcogenides; Palladium selenide; Palladium sulphide; Scanning electron microscopy; X-ray diffraction; Chemical vapour deposition; LP-MOCVD; COMPLEXES; NANOPARTICLES; SULFIDE;
D O I
10.1016/j.tsf.2010.07.101
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Platinum and palladium dithio/diselenoimidodiphosphinato complexes have been synthesized and used as single source precursors for the deposition of platinum and palladium chalcogenide thin films by the Low Pressure Chemical Vapour Deposition technique. Pure PtSe2 thin films were deposited at varying temperatures from the [Pt{N((SePPr2)-Pr-i)(2)}(2)] complex. However, only Pt films were obtained from the sulfur analogue. The palladium diselenoimidodiphosphinato complex gave palladium selenide films with different stochiometries depending on the growth temperature. The corresponding sulfur complex gave PdS2 films with a regular platelet-like morphology. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:197 / 202
页数:6
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