Short-Circuit Study in Medium-Voltage GaN Cascodes, p-GaN HEMTs, and GaN MISHEMTs

被引:67
作者
Fernandez, Manuel [1 ]
Perpina, Xavier [1 ]
Roig-Guitart, Jaume [2 ]
Vellvehi, Miquel [1 ]
Bauwens, Filip [2 ]
Tack, Marnix [2 ]
Jorda, Xavier [1 ]
机构
[1] Inst Microelect Barcelona, Ctr Nacl Microelect, Consejo Super Invest Cient, Barcelona 08193, Spain
[2] Corp R&D, Power Technol Ctr, Semicond Belgium BVBA, B-9700 Oudenaarde, Belgium
关键词
Enhancement mode; failure analysis; Gallium Nitride (GaN) cascode; GaN High-Electron-Mobility Transistors (GaN HEMTs); GaN Metal-Insulator-Semiconductor HEMTs (MISHEMTs); hard switch fault; reliability; robustness; Short Circuit (SC); simulation; wide band gap semiconductors; IGBT; BEHAVIOR;
D O I
10.1109/TIE.2017.2719599
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
This paper studies by experimentation and physics-based simulation the Short-Circuit (SC) capability of several normally-off 600-650 V Gallium Nitride High-Electron-Mobility Transistors (GaNHEMTs): cascodes, p-GaN, and GaN Metal-Insulator-Semiconductor HEMTs (MISHEMTs). As a result, cascodes present the worst SC ruggedness. By contrast, p-GaN gate HEMTs and MISHEMTs provide a higher SC capability thanks to their strong drain current reduction. In addition, a valuable state-of-the-art about all commercially available technologies is also provided, which demonstrates that current GaN devices do not allow SC capability.
引用
收藏
页码:9012 / 9022
页数:11
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