Tailored antireflective biomimetic nanostructures for UV applications

被引：33

作者：

Morhard, Christoph ^{[1
,2
]}

Pacholski, Claudia ^{[1
,2
]}

Lehr, Dennis ^{[3
]}

Brunner, Robert ^{[3
,4
]}

Helgert, Michael ^{[3
]}

Sundermann, Michael ^{[5
]}

Spatz, Joachim P. ^{[1
,2
]}

机构：

[1] Max Planck Inst Met Res, Dept New Mat & Biosyst, D-70569 Stuttgart, Germany

[2] Heidelberg Univ, Dept Biophys Chem, D-69120 Heidelberg, Germany

[3] Carl Zeiss Jena GmbH, Ctr Technol, D-07745 Jena, Germany

[4] Univ Appl Sci Jena, SciTec, D-07745 Jena, Germany

[5] Carl Zeiss Jena GmbH, Ctr Technol, D-73447 Oberkochen, Germany

来源：

NANOTECHNOLOGY | 2010年 / 21卷 / 42期

关键词：

COPOLYMER MICELLE NANOLITHOGRAPHY; ARRAY; LIGHT;

D O I：

10.1088/0957-4484/21/42/425301

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Antireflective surfaces composed of biomimetic sub-wavelength structures that employ the 'moth eye principle' for reflectance reduction are highly desirable in many optical applications such as solar cells, photodetectors and laser optics. We report an efficient approach for the fabrication of antireflective surfaces based on a two-step process consisting of gold nanoparticle mask generation by micellar block copolymer nanolithography and a multi-step reactive ion etching process. Depending on the RIE process parameters nanostructured surfaces with tailored antireflective properties can easily be fabricated that show optimum performance for specific applications.

引用

页数：6

共 16 条

[1] Tunable reflection minima of nanostructured antireflective surfaces [J].