Control of conduction type in Al- and N-codoped ZnO thin films

被引:81
作者
Yuan, GD
Ye, ZZ [1 ]
Zhu, LP
Qian, Q
Zhao, BH
Fan, RX
Perkins, CL
Zhang, SB
机构
[1] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
[2] Natl Renewable Energy Lab, Golden, CO 80401 USA
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.1928318
中图分类号
O59 [应用物理学];
学科分类号
摘要
p-type ZnO thin films have been fabricated by an Al- and N-codoping technique at the growth temperature between 380 and 480 degrees C, as identified by the Hall measurement. At lower and higher temperatures, however, the samples are n type. The best p-type sample shows a resistivity and hole concentration of 24.5 Omega cm and 7.48x10(17) cm(-3) at room temperature, respectively. Spread resistance depth profile further shows the transition from n-type substrate to p-type ZnO through a clearly defined depletion region. Photoluminescence spectra also show low signal in deep level transition, indicating a low density of native defects. (c) 2005 American Institute of Physics.
引用
收藏
页码:1 / 3
页数:3
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