TWO-MESA, GUARD RINGS ASSISTED TWO-ZONE JTE FOR ULTRAHIGH-VOLTAGE(>10KV) 4H-SiC P-I-N DIODES

被引:0
|
作者
Ding, Yang [1 ]
Yue, Ruifeng [1 ]
Zhang, Li [1 ]
Wang, Yan [1 ]
机构
[1] Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
来源
2014 12TH IEEE INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT) | 2014年
关键词
PIN-DIODES; THYRISTOR; KV;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel edge termination, referred to as two-mesa, guard rings (gr) assisted two-zone junction termination extension, is presented for ultrahigh-voltage (>10kV) 4H-SiC p-i-n diodes to extend the ultrahigh-voltage (UHV) JTE doping concentration window and increase the breakdown voltage. By device simulation and comparison using Sentaurus (R) simulator, a diode with UHV of 15450V is designed and the JTE doping concentration window is significantly extended by a ratio of 233.3%.
引用
收藏
页数:3
相关论文
共 5 条
  • [1] Space-Modulated Junction Termination Extension for Ultrahigh-Voltage p-i-n Diodes in 4H-SiC
    Feng, Gan
    Suda, Jun
    Kimoto, Tsunenobu
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2012, 59 (02) : 414 - 418
  • [2] Single-Implant, Field Plate and Guard Rings Assist Multi-Zone Graded JTE for 4H-SiC p-i-n Diodes
    Ding, Yang
    Zhang, Li
    Wang, Yan
    Yue, Ruifeng
    2014 IEEE INTERNATIONAL CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC), 2014,
  • [3] An Improved ICP Etching for Mesa-Terminated 4H-SiC p-i-n Diodes
    Han, Chao
    Zhang, Yuming
    Song, Qingwen
    Zhang, Yimen
    Tang, Xiaoyan
    Yang, Fei
    Niu, Yingxi
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2015, 62 (04) : 1223 - 1229
  • [4] Radiation Resistance of High-Voltage Silicon and 4H-SiC Power p-i-n Diodes
    Hazdra, Pavel
    Smrkovsky, Petr
    Vobecky, Jan
    Mihaila, Andrei
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2021, 68 (01) : 202 - 207
  • [5] Analysis of Trapping Effects on the Forward Current-Voltage Characteristics of Al-Implanted 4H-SiC p-i-n Diodes
    Megherbi, M. Larbi
    Pezzimenti, Fortunato
    Dehimi, Lakhdar
    Saadoune, M. Achour
    Della Corte, Francesco G.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (08) : 3371 - 3378