Improved glass-PDMS-glass device technology for accurate measurements of electro-osmotic mobilities

被引:12
作者
Plecis, Adrien [1 ]
Chen, Yong [2 ]
机构
[1] CNRS, Lab Pholon & Nanostruct, F-91460 Marcoussis, France
[2] Ecole Normale Super, F-75231 Paris, France
关键词
microfluidics; glass; PDMS; reactive ion etch;
D O I
10.1016/j.mee.2008.01.097
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We demonstrate an improved glass-PDMS-glass device technology based on reactive ion etch of a thin PDMS layer for microfluidic channel forming and glass to glass bonding. Reactive ion etch process has been optimised to achieve a high etch rate and a minimum surface roughness. Typically, microfluidic channels of 2.5 mu m height and 50 mu m width are obtained on a wafer scale, providing a patternable glass-liquid interface larger than 95% of the total channel wall surface. To illustrate the capability of this technique, electrokinetic characterization of soda-lime glass (D-263) surfaces are presented. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:1334 / 1336
页数:3
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