Nanomechanical investigation of the effects of nanoSiO2 on C-S-H gel/cement grain interfaces

被引：53
作者：
Xu, Jing [1 ]
Corr, David J. [2 ]
Shah, Surendra P. [2 ]
机构：
[1] Tongji Univ, Minist Educ, Key Lab Adv Civil Engn Mat, Shanghai 201804, Peoples R China
[2] Northwestern Univ, Dept Civil & Environm Engn, Evanston, IL 60208 USA
来源：
CEMENT & CONCRETE COMPOSITES | 2015年 / 61卷
基金：
美国国家科学基金会; 中国国家自然科学基金;
关键词：
Cement-based materials; Nanomechanical properties; Interface; Nanoindentation; Modulus mapping; NanoSiO(2); CEMENT-BASED MATERIALS; ELASTIC-MODULUS; NANOINDENTATION; NANOSCALE; CONCRETE; HARDNESS; PASTE;
D O I：
10.1016/j.cemconcomp.2015.04.011
中图分类号：
TU [建筑科学];
学科分类号：
0813 ;
摘要：
In this paper, nanoindentation and viscoelastic modulus mapping were employed to study the influence of nanoSiO(2) on the properties of the interface between C-S-H gel and cement grains. The interface width measured by modulus mapping was around 200 nm as compared to a rough estimation of less than 5 pm by nanoindentation, due to the fact that 2 orders of magnitude increase in spatial resolution can be achieved with modulus mapping. Although the influence of nanoSiO(2) on the interface width was not significant, its impact on nanomechanical properties of the interface was marked. The data suggest an improvement of modulus and hardness of the interface by nanoSiO(2) in early age. This interface, which could be regarded as a layer surrounding cement grains, become denser by the addition of nanoSiO(2). (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码：7 / 17
页数：11
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