Real-time vacuum leak detection technology to calculate vacuum leak parameters for dry stripping

被引：0

作者：

Jeong, Jaepyo ^{[1
]}

Ha, Taekyung ^{[1
]}

Ji, Hyojeong ^{[1
]}

Yoon, Sung Jin ^{[1
]}

机构：

[1] PSK Inc, Seoku Dong 445170, Hwaseoung Si, South Korea

来源：

2022 33RD ANNUAL SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE (ASMC) | 2022年

关键词：

Real-time vacuum leak detection; PR dry strip; Leak-dependent parameters;

D O I：

10.1109/ASMC54647.2022.9792477

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In semiconductor manufacturing, vacuum leakage occurring during wafer processing decreases productivity. Conventionally, the equipment is stopped to detect the vacuum leaks. However, this adversely affects productivity. We presents a real-time vacuum leak detection technique. We successfully identified vacuum leakage in real time by interpolating from the dry strip process parameters.

引用

页数：4

共 5 条

[1] HELIUM LEAK DETECTORS - FROM A LABORATORY DEVICE TO DEDICATED INDUSTRIAL LEAK TEST UNITS [J].

BLEY, WG .

VACUUM, 1993, 44 (5-7) :627-632

[2] Vacuum Leak Detection Method Using Index Regression and Correction for Semiconductor Equipment in a Vacuum Chamber [J].

Ha, Taekyung ;

Shin, Hyunjung .

APPLIED SCIENCES-BASEL, 2021, 11 (24)

[3]

Sadollah A., 2018, Fuzzy Logic Based in Optimization Methods and Control Systems and its Applications, DOI [DOI 10.5772/INTECHOPEN.79552, DOI 10.5772/INTECHOPEN]

[4] Comparison of the effects of downstream H2- and O2-based plasmas on the removal of photoresist, silicon, and silicon nitride [J].

Thedjoisworo, Bayu ;

Cheung, David ;

Crist, Vince .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2013, 31 (02)

[5]

Yoon SJ, 2019, ASMC PROC

← 1 →