A fundamental study on residual stress measurement of thin film materials using synchrotron radiation

被引：0

作者：

Gotoh, M ^{[1
]}

Takago, S ^{[1
]}

Sasaki, T ^{[1
]}

Yoshioka, Y ^{[1
]}

Hirose, Y ^{[1
]}

机构：

[1] Kanazawa Univ, Venture Business Lab, Kanazawa, Ishikawa 920, Japan

来源：

PROCEEDINGS OF THE FIFTEENTH (2005) INTERNATIONAL OFFSHORE AND POLAR ENGINEERING CONFERENCE, VOL 4 | 2005年

关键词：

residual stress; TiN; thin film; annealing; synchrotron radiation; X-ray; stress gradient;

D O I：

暂无

中图分类号：

U6 [水路运输]; P75 [海洋工程];

学科分类号：

0814 ; 081505 ; 0824 ; 082401 ;

摘要：

TiN thin films deposited on the high speed steel materials improve the wear resistance to protect the steel surfaces. It was reported that highly compressive residual stress in TiN thin films was relaxed due to annealing by the authors. In this study, residual stresses in thin films materials were measured with X-ray from synchrotron radiation source (SR). SR has high brightness beam with small divergence. As a result, the tendency of stress relaxation was relatively similar to that of conventional X-ray. However, absolute values of residual stress did not correspond to those of X-rays from SR.

引用

页码：224 / 229

页数：6

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