Cross-scale and cross-precision structures/systems fabricated by high-efficiency and low-cost hybrid 3D printing technology

被引:7
作者
Tan, Mingyue [1 ,2 ]
Cao, Jiaji [3 ]
Zhao, Shaoqing [1 ,2 ]
Huang, Long [1 ,2 ]
Zhang, Han [1 ,2 ]
Liu, Minzhe [4 ]
Jia, Zhongqing [4 ]
Zhai, Ruizhan [4 ]
Lu, Zifeng [1 ,2 ]
Liu, Hua [1 ,2 ]
机构
[1] Northeast Normal Univ, Ctr Adv Optoelect Funct Mat Res, 5268 Renmin St, Changchun 130024, Peoples R China
[2] Northeast Normal Univ, Natl Demonstrat Ctr Expt Phys Educ, Key Lab UV Emitting Mat & Technol, Minist Educ, 5268 Renmin St, Changchun 130024, Peoples R China
[3] Changchun Univ Sci & Technol, Key Lab Cross Scale Micro & Nano Mfg, Minist Educ, Changchun 130022, Peoples R China
[4] Qilu Univ Technol, Laser Inst, Shandong Acad Sci, Qingdao 266000, Shandong, Peoples R China
基金
中国国家自然科学基金;
关键词
Hybrid 3D printing; Two-photon polymerization; DMD micro stereolithography; Alignment accuracy; Optofluidic system; DIGITAL MICROMIRROR DEVICE; 2-PHOTON POLYMERIZATION; LASER; LITHOGRAPHY; MICROFABRICATION; MICROSTRUCTURES; COMBINATION; MICROSCOPY; SCAFFOLDS; EXPOSURE;
D O I
10.1016/j.addma.2022.103169
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Three-dimensional (3D) printing is widely used in many fields such as micro-optics, microbiology, and micro -fluidics. However, using existing technologies is a challenge to efficiently fabricate high-quality 3D structures with cross-scale and cross-precision. In this paper, we propose a low-cost hybrid processing technology that combines two-photon polymerization (TPP) and DMD micro stereolithography (DMDMSL) (TPP-DMDMSL). This low-cost hybrid processing technology is a two-part alignment achieved by combining marker positioning and image processing, and then by coordinating the transformation of processing data. Using the same mark as a bridge, the two independent technologies are linked to realize hybrid processing. The high synergetic combi-nation of the two technologies is realized by using the mask as the benchmark and combining it with the flexible real-time transformation of processing data. The horizontal and vertical alignment accuracy is 2 mu m and 3 mu m, respectively. TPP-DMDMSL unites the high precision of TPP with the high efficiency of DMDMSL. Taking the aspheric lens as an example (radius = 163 mu m, height = 33 mu m), TPP-DMDMSL reduces the time from 4 h to 1 h. The maximum surface error is 0.22 mu m, which does not affect the image quality according to the Rayleigh cri-terion. TPP-DMDMSL manufactures different types of structures. These results prove that TPP-DMDMSL can print multiple types of 3D structures across scales and precision, which is challenging or time-consuming with existing technologies. TPP-DMDMSL will likely be extended to more micro and nano fields based on the original general technology. TPP-DMDMSL provides strong basic techniques and ideas for integrated hybrid processing systems in the future.
引用
收藏
页数:13
相关论文
共 68 条
  • [1] 3D microfluidics via cyclic olefin polymer-based in situ direct laser writing
    Alsharhan, Abdullah T.
    Acevedo, Ruben
    Warren, Roseanne
    Sochol, Ryan D.
    [J]. LAB ON A CHIP, 2019, 19 (17) : 2799 - 2810
  • [2] A Novel Fold-Based Design Approach toward Printable Soft Robotics Using Flexible 3D Printing Materials
    Ang, Benjamin Wee Keong
    Yeow, Raye Chen Hua
    [J]. ADVANCED MATERIALS TECHNOLOGIES, 2018, 3 (02):
  • [3] [Anonymous], 2012, J. Manuf. Process.
  • [4] RAYLEIGH WAVEFRONT CRITERION
    BARAKAT, R
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1965, 55 (05) : 572 - &
  • [5] Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures
    Burrow, Guy M.
    Gaylord, Thomas K.
    [J]. MICROMACHINES, 2011, 2 (02) : 221 - 257
  • [6] A hybrid exposure concept for lithography-based additive manufacturing
    Busetti, Bernhard
    Steyrer, Bernhard
    Lutzer, Bernhard
    Reiter, Rafael
    Stampfl, Juergen
    [J]. ADDITIVE MANUFACTURING, 2018, 21 : 413 - 421
  • [7] Functional Materials for Two-Photon Polymerization in Microfabrication
    Carlotti, Marco
    Mattoli, Virgilio
    [J]. SMALL, 2019, 15 (40)
  • [8] High-resolution maskless lithography
    Chan, KF
    Feng, ZQ
    Yang, R
    Ishikawa, A
    Mei, WH
    [J]. JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2003, 2 (04): : 331 - 339
  • [9] Edge smoothness enhancement in DMD scanning lithography system based on a wobulation technique
    Chen, Ronghuan
    Liu, Hua
    Zhang, Haolin
    Zhang, Wenjuan
    Xu, Jia
    Xu, Wenbin
    Li, Jinhuan
    [J]. OPTICS EXPRESS, 2017, 25 (18): : 21958 - 21968
  • [10] Ultrafast axial scanning for two-photon microscopy via a digital micromirror device and binary holography
    Cheng, Jiyi
    Gu, Chenglin
    Zhang, Dapeng
    Wang, Dien
    Chen, Shih-Chi
    [J]. OPTICS LETTERS, 2016, 41 (07) : 1451 - 1454