Fresnoite thin films grown by pulsed laser deposition: photoluminescence and laser crystallization

被引:29
|
作者
Mueller, Alexander [1 ]
Lorenz, Michael [1 ]
Brachwitz, Kerstin [1 ]
Lenzner, Joerg [1 ]
Mittwoch, Kai [2 ]
Skorupa, Wolfgang [3 ]
Grundmann, Marius [1 ]
Hoeche, Thomas [4 ]
机构
[1] Univ Leipzig, Inst Expt Phys 2, D-04103 Leipzig, Germany
[2] 3D Micromac AG, D-09126 Chemnitz, Germany
[3] Helmholtz Zentrum Dresden Rossendorf, Semicond Mat Div, D-01314 Dresden, Germany
[4] Leibniz Inst Oberflachenmodifizierung eV, D-04318 Leipzig, Germany
来源
CRYSTENGCOMM | 2011年 / 13卷 / 21期
关键词
ORIENTED GLASS-CERAMICS; SYSTEM BA2TISI2O8-SIO2; OPTICAL NONLINEARITY; BAO-TIO2-SIO2; GLASS; CRYSTAL; BA2TIGE2O8; COMPOUND; ZNO; SR2TISI2O8; INSIGHTS;
D O I
10.1039/c1ce05265a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Fresnoite (Ba2TiSi2O8-BTS) thin films were grown on fused quartz, silicon (100), MgO (100), and a-plane sapphire by pulsed laser deposition, and crystallized by subsequent thermal or flash lamp annealing. The corresponding texture evolution of the BTS thin films was studied by X-ray diffraction. The preferential (001) texture of the crystallised BTS films was found to be most pronounced on sapphire substrates. The broad photoluminescence band of the BTS thin films depends only weakly on temperature. The intensity of the BTS luminescence can be as high as that of the most efficient oxide scintillator materials. In order to qualify the fresnoite thin films for photonic applications, we demonstrate infrared-laser direct writing in amorphous BTS films which allows a local crystallisation and patterning. A subsequent considerable enhancement of luminescence intensity can be applied for UV-sensitive marking of nearly any object.
引用
收藏
页码:6377 / 6385
页数:9
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