Gallium nitride based high power heterojunction field effect transistors: Process development and present status at UCSB

被引:169
作者
Keller, S [1 ]
Wu, YF
Parish, G
Ziang, NQ
Xu, JJ
Keller, BP
DenBaars, SP
Mishra, UK
机构
[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
[2] Cree Lighting Co, Goleta, CA 93117 USA
关键词
FET; gallium nitride; microwave power;
D O I
10.1109/16.906450
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The development of GaN based devices for microwave power electronics at the University of California, Santa Barbara (UCSB), is reviewed, From 1995 to 2000, the power performance of AlGaN/GaN on-sapphire heterojunction field effect transistors improved from 1.1 W/mm to 6.6 W/mm, respectively. Compensating the disadvantages of the low thermal conductivity of the sapphire substrate through heat management via flip chip bonding onto AIN substrates, large periphery devices with an output power of 7.6 W were demonstrated. UCSB also fabricated the first GaN based amplifier integrated circuits, Critical issues involved in the growth of high quality AlGaN/GaN heterostructures by metal-organic chemical vapor deposition and the device fabrication are discussed.
引用
收藏
页码:552 / 559
页数:8
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