共 7 条
[1]
[Anonymous], APPL PHYS LETT
[2]
Highly scalable non-volatile resistive memory using simple binary oxide driven by asymmetric unipolar voltage pulses
[J].
Baek, IG
;
Lee, MS
;
Seo, S
;
Lee, MJ
;
Seo, DH
;
Suh, DS
;
Park, JC
;
Park, SO
;
Kim, HS
;
Yoo, IK
;
Chung, UI
;
Moon, JT
.
IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST,
2004,
:587-590

Baek, IG
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Lee, MS
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Seo, S
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Lee, MJ
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Seo, DH
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Suh, DS
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Park, JC
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Park, SO
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Kim, HS
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Yoo, IK
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Chung, UI
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea

Moon, JT
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea Samsung Elect Co Ltd, Semicond R&D Ctr, Proc Dev Team, Yongin 449711, Kyeonggi Do, South Korea
[3]
HOSOI Y, 2006, IEDM, P793
[4]
Ielmini D, 2009, APPL PHYS LETT, V94, P063511
[5]
Electrical Manipulation of Nanofilaments in Transition-Metal Oxides for Resistance-Based Memory
[J].
Lee, Myoung-Jae
;
Han, Seungwu
;
Jeon, Sang Ho
;
Park, Bae Ho
;
Kang, Bo Soo
;
Ahn, Seung-Eon
;
Kim, Ki Hwan
;
Lee, Chang Bum
;
Kim, Chang Jung
;
Yoo, In-Kyeong
;
Seo, David H.
;
Li, Xiang-Shu
;
Park, Jong-Bong
;
Lee, Jung-Hyun
;
Park, Youngsoo
.
NANO LETTERS,
2009, 9 (04)
:1476-1481

论文数: 引用数:
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Han, Seungwu
论文数: 0 引用数: 0
h-index: 0
机构:
Ewha Womans Univ, Dept Phys, Seoul 120750, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Jeon, Sang Ho
论文数: 0 引用数: 0
h-index: 0
机构:
Konkuk Univ, Div Quantum Phases & Devices, Sch Phys, Seoul 143701, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Park, Bae Ho
论文数: 0 引用数: 0
h-index: 0
机构:
Konkuk Univ, Div Quantum Phases & Devices, Sch Phys, Seoul 143701, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Kang, Bo Soo
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Ahn, Seung-Eon
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

论文数: 引用数:
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Lee, Chang Bum
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Kim, Chang Jung
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Yoo, In-Kyeong
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Seo, David H.
论文数: 0 引用数: 0
h-index: 0
机构:
Stanford Univ, Dept Mat Sci & Engn, Palo Alto, CA 94305 USA Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Li, Xiang-Shu
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Park, Jong-Bong
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Lee, Jung-Hyun
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea

Park, Youngsoo
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea
[6]
Low power and high speed switching of Ti-doped NiOReRAM under the unipolar voltage source of less than 3 V
[J].
Tsunoda, K.
;
Kinoshita, K.
;
Noshiro, H.
;
Yamazaki, Y.
;
Iizuka, T.
;
Ito, Y.
;
Takahashi, A.
;
Okano, A.
;
Sato, Y.
;
Fukano, T.
;
Aoki, M.
;
Sugiyama, Y.
.
2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2,
2007,
:767-+

Tsunoda, K.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Kinoshita, K.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Noshiro, H.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Yamazaki, Y.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Iizuka, T.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Ito, Y.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Takahashi, A.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Okano, A.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Sato, Y.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Fukano, T.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Aoki, M.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan

Sugiyama, Y.
论文数: 0 引用数: 0
h-index: 0
机构:
Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan Fujitsu Labs Ltd, 10-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430197, Japan
[7]
Nanoionics-based resistive switching memories
[J].
Waser, RaineR
;
Aono, Masakazu
.
NATURE MATERIALS,
2007, 6 (11)
:833-840

Waser, RaineR
论文数: 0 引用数: 0
h-index: 0
机构:
Rhein Westfal TH Aachen, Inst Werkstoffe Elektrotech 2, D-52056 Aachen, Germany Rhein Westfal TH Aachen, Inst Werkstoffe Elektrotech 2, D-52056 Aachen, Germany

Aono, Masakazu
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机构: Rhein Westfal TH Aachen, Inst Werkstoffe Elektrotech 2, D-52056 Aachen, Germany