An asymmetric memory cell using a C-TFT for single-bit-line SRAM's

被引:6
作者
Kuriyama, H [1 ]
Ashida, M [1 ]
Tsutsumi, K [1 ]
Maegawa, S [1 ]
Maeda, S [1 ]
Anami, K [1 ]
Nishimura, T [1 ]
Kohno, Y [1 ]
Miyoshi, H [1 ]
机构
[1] Mitsubishi Elect Co, ULSI Lab, Itami, Hyogo 664, Japan
关键词
asymmetric memory cell (AMC); cell ratio; complementary TFT (C-TFT); low-power; low-voltage; n-channel TFT; p-channel TFT; single-bit-line; SRAM; static noise margin (SNM);
D O I
10.1109/16.760399
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper proposes a compact single-bit-line SRAM memory cell which we call an asymmetric memory cell (AMC) using a complementary thin-film transistor (C-TFT). A C-TFT is composed of a top-gate n-channel TFT and a bottom-gate p-channel TFT. The proposed cell size can be reduced to 88% as compared with the conventional one using 0.4-μm design rules. Stable read and write operations under low-voltage can be realized by using a C-TFT. © 1999 IEEE.
引用
收藏
页码:927 / 932
页数:6
相关论文
共 13 条
  • [1] DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS
    DENNARD, RH
    GAENSSLEN, FH
    YU, HN
    RIDEOUT, VL
    BASSOUS, E
    LEBLANC, AR
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1974, SC 9 (05) : 256 - 268
  • [2] HAYASHI F, 1992, S VLSI, P36
  • [3] Ikeda S., 1993, International Electron Devices Meeting 1993. Technical Digest (Cat. No.93CH3361-3), P809, DOI 10.1109/IEDM.1993.347276
  • [4] Itabashi K., 1991, International Electron Devices Meeting 1991. Technical Digest (Cat. No.91CH3075-9), P477, DOI 10.1109/IEDM.1991.235352
  • [5] ITOH K, 1991, 1991 INT C SOL STAT, P468
  • [6] KURIYAMA H, 1992, S VLSI TECHN DIG TEC, P38
  • [7] A 0.4 MU-M GATE-ALL-AROUND TFT (GAT) USING A DUMMY NITRIDE PATTERN FOR HIGH-DENSITY MEMORIES
    MAEGAWA, S
    IPPOSHI, T
    MAEDA, S
    NISHIMURA, H
    TANINA, O
    KURIYAMA, H
    INOUE, Y
    NISHIMURA, T
    TSUBOUCHI, N
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1995, 34 (2B): : 895 - 899
  • [8] Ohkubo H., 1991, International Electron Devices Meeting 1991. Technical Digest (Cat. No.91CH3075-9), P481, DOI 10.1109/IEDM.1991.235351
  • [9] A 16-MB CMOS SRAM WITH A 2.3-MU-M(2) SINGLE-BIT-LINE MEMORY CELL
    SASAKI, K
    UEDA, K
    TAKASUGI, K
    TOYOSHIMA, H
    ISHIBASHI, K
    YAMANAKA, T
    HASHIMOTO, N
    OHKI, N
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1993, 28 (11) : 1125 - 1130
  • [10] STATIC-NOISE MARGIN ANALYSIS OF MOS SRAM CELLS
    SEEVINCK, E
    LIST, FJ
    LOHSTROH, J
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1987, 22 (05) : 748 - 754