Properties of deep levels and photorefractive effect in GaAs/AlGaAs multiple quantum wells grown in low temperature

被引:2
|
作者
Huang, Q [1 ]
Guo, LW [1 ]
Zhang, MH [1 ]
Zhang, YF [1 ]
Han, YJ [1 ]
Zhou, JM [1 ]
机构
[1] Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China
关键词
point defects; molecular beam epitaxy; photorefractive materials; semiconducting gallium arsenide;
D O I
10.1016/S0022-0248(01)00644-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We report on the properties of GaAs/AlGaAs multiple quantum wells grown at medium temperature range 300-400 degreesC. The samples exhibit both of sharp exciton absorption and ultrafast carrier lifetime, which are suitable as photorefractive devices. Photoluminescence, absorption spectroscopy, optical transient current spectroscopy and pump-probe technique were used to characterize the materials grown on GaAs (0 0 1) on-axis or miscut substrates. Using a YAG:Nd laser as a pump source, the quenchable characteristics of EL2-like defects were observed in electroabsorption for the first rime. By optimizing growth parameters and device structure, the transient diffraction efficiency approaches 1.2% and 4.5% in non-degeneration four-wave mixing under Frantz-Keldysh and Stark geometry, respectively. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:117 / 122
页数:6
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