Exploring the Structure of the Modified Top Layer of Polypropylene During Plasma Treatment

被引:14
作者
Corbella, Carles [1 ]
Grosse-Kreul, Simon [1 ]
von Keudell, Achim [1 ]
机构
[1] Ruhr Univ Bochum, Res Grp React Plasmas, Inst Expt Phys 2, D-44780 Bochum, Germany
关键词
modified top layer; plasma treatment; poly(propylene) (PP); polymer-like carbon (PLC); time-resolved FTIR; SURFACE; POLYMERS;
D O I
10.1002/ppap.201400188
中图分类号
O59 [应用物理学];
学科分类号
摘要
Plasma modifications of polypropylene (PP) surfaces are analyzed by means of vacuum beam experiments. A plasma source provides Ar ion beams and a background of UV photons. Additionally, neutral oxygen beams are sent to perform reactive sputtering of PP. The etch rate and chemical state are monitored in real time by in situ Fourier transform infrared (FTIR) spectroscopy. At the onset of Ar bombardment, PP shows high sputter yields, which decrease down to a constant etch rate indicating the formation of a modified top layer. The stationary top layer is modeled as combination of a pristine fraction plus a crosslinked fraction of amorphous hydrocarbon. Photonand ion-dominated etch processes provide different cross-linking fractions, whereas the sputter efficiency is maximized at intermediate ion energies (200 eV).
引用
收藏
页码:564 / 573
页数:10
相关论文
共 17 条
  • [1] Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces
    Corbella, Carles
    Grosse-Kreul, Simon
    Kreiter, Oliver
    de los Arcos, Teresa
    Benedikt, Jan
    von Keudell, Achim
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 2013, 84 (10)
  • [2] Friedrich Jorg., 2012, PLASMA CHEM POLYM SU
  • [3] Surface Modification of Polypropylene (PP) by Argon Ions and UV Photons
    Grosse-Kreul, Simon
    Corbella, Carles
    von Keudell, Achim
    Ozkaya, Berkem
    Grundmeier, Guido
    [J]. PLASMA PROCESSES AND POLYMERS, 2013, 10 (12) : 1110 - 1119
  • [4] Chemical and Physical Sputtering of Polyethylene Terephthalate (PET)
    Grosse-Kreul, Simon
    Corbella, Carles
    von Keudell, Achim
    [J]. PLASMA PROCESSES AND POLYMERS, 2013, 10 (03) : 225 - 234
  • [5] Synergistic etch rates during low-energetic plasma etching of hydrogenated amorphous carbon
    Hansen, T. A. R.
    Weber, J. W.
    Colsters, P. G. J.
    Mestrom, D. M. H. G.
    van de Sanden, M. C. M.
    Engeln, R.
    [J]. JOURNAL OF APPLIED PHYSICS, 2012, 112 (01)
  • [6] Plasma treatment of polymers for surface and adhesion improvement
    Hegemann, D
    Brunner, H
    Oehr, C
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 208 : 281 - 286
  • [7] Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen
    Hopf, C.
    Schlueter, M.
    Schwarz-Selinger, T.
    von Toussaint, U.
    Jacob, W.
    [J]. NEW JOURNAL OF PHYSICS, 2008, 10
  • [8] Ion-induced oxidation of aluminum during reactive magnetron sputtering
    Kreiter, Oliver
    Grosse-Kreul, Simon
    Corbella, Carles
    von Keudell, Achim
    [J]. JOURNAL OF APPLIED PHYSICS, 2013, 113 (14)
  • [9] Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication
    Oehrlein, Gottlieb S.
    Phaneuf, Raymond J.
    Graves, David B.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2011, 29 (01): : 0108011 - 01080135
  • [10] Diamond-like amorphous carbon
    Robertson, J
    [J]. MATERIALS SCIENCE & ENGINEERING R-REPORTS, 2002, 37 (4-6) : 129 - 281