Vapor growth of electrochromic thin films of transition metal oxides

被引：9

作者：

Gesheva, K. A. ^{[1
]}

Ivanova, T. ^{[1
]}

Marsen, B. ^{[2
]}

Zollo, G. ^{[3
]}

Kalitzova, M. ^{[4
]}

机构：

[1] Bulgarian Acad Sci, Cent Lab Solar Energy & New Energy Source, BU-1784 Sofia, Bulgaria

[2] Univ Hawaii Manoa, Sch Ocean & Earth Sci & Technol, Hawaii Nat Energy Inst, Honolulu, HI 96822 USA

[3] Univ Roma La Sapienza, Dipartimento Energet, I-00161 Rome, Italy

[4] Bulgarian Acad Sci, Inst Solid State Phys, BU-1784 Sofia, Bulgaria

来源：

JOURNAL OF CRYSTAL GROWTH | 2008年 / 310卷 / 7-9期

关键词：

X-ray diffraction; metalorganic chemical vapor deposition; oxides; electrochromic properties;

D O I：

10.1016/j.jcrysgro.2007.12.034

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Mixed oxide films of transition metals gain considerable much attention due to their interesting optoelectronic properties. The low temperature chemical vapor growth processing of thin films of mixed W and Mo oxides is presented. The investigation is related to optimization of films structure and the related optoelectronic properties in dependence on the chemical vapor deposition (CVD) process parameters. Their electrochromic behavior and photoelectrode properties were studied. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：2103 / 2109

页数：7

共 22 条

[1] Sputter deposited electrochromic films and devices based on these:: Progress on nickel-oxide-based films
Avendano, A.
Azens, A.
Niklasson, G. A.
Granqvist, C. G.
[J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 138 (02): : 112 - 117
[2] OPPORTUNITIES AND CHALLENGES OF ELECTROCHROMIC PHENOMENA IN TRANSITION-METAL OXIDES
DEB, SK
[J]. SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1992, 25 (3-4) : 327 - 338
[3] DETORRESI SIC, 1991, ELECTROANAL CHEM, V381, P131
[4] XRD study of the grain growth in CdTe films annealed at different temperatures
Enríquez, JP
Mathew, X
[J]. SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2004, 81 (03) : 363 - 369
[5] ELECTROCHEMICAL PHOTOLYSIS OF WATER AT A SEMICONDUCTOR ELECTRODE
FUJISHIMA, A
HONDA, K
[J]. NATURE, 1972, 238 (5358) : 37 - +
[6] Deposition and characterization of CVD-MoO3 thin films
Gesheva, KA
Ivanova, T
Iossifova, A
Gogova, D
Porat, R
[J]. JOURNAL DE PHYSIQUE IV, 1999, 9 (P8): : 453 - 459
[7] A low-temperature atmospheric pressure CVD process for growing thin films of MoO3 and MoO3-WO3 for electrochromic device applications
Gesheva, Kostadinka A.
Ivanova, Tatyana
[J]. CHEMICAL VAPOR DEPOSITION, 2006, 12 (04) : 231 - 238
[8] Lithium insertion in sputtered amorphous molybdenum thin films
Gorenstein, A
Scarminio, J
Lourenco, A
[J]. SOLID STATE IONICS, 1996, 86-8 : 977 - 981
[9] Granqvist C. G., 1995, HDB INORGANIC ELECTR
[10] Hutchins MG, 1999, PHYS STATUS SOLIDI A, V176, P991, DOI 10.1002/(SICI)1521-396X(199912)176:2<991::AID-PSSA991>3.0.CO

← 1 2 3 →