Atomic structure of epitaxial SrTiO3-GaAs(001) heterojunctions -: art. no. 143106

被引:26
作者
Klie, RF [1 ]
Zhu, Y
Altman, EI
Liang, Y
机构
[1] Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11021 USA
[2] Yale Univ, Dept Chem Engn, New Haven, CT 06520 USA
[3] Freescale Semicond Inc, Adv Prod Res & Dev Lab, Tempe, AZ 85284 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2077837
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have examined the atomic and electronic structures of epitaxial SrTiO3 thin films on GaAs (001) deposited under different growth conditions in order to understand the interfacial structure-property relationships. High-resolution Z-contrast images show an atomically sharp heterointerface with SrTiO3[110] in perfect registry with GaAs [100] and the interfacial structure remains unchanged if a submonolayer of Ti was deposited prior to the SrTiO3 film growth. X-ray photoelectron spectroscopy shows that the Fermi level was pinned during the initial stage of growth when a submonolayer of Ti was deposited on As-terminated GaAs(001); subsequent SrTiO3 growth alleviated this pinning. These results indicate a self-driven interfacial atomic structure formation, independent of the initial stage of growth. (C) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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