Overview of coating growth mechanisms in MOCVD processes as observed in Pt group metals

被引：40
作者：
Igumenov, Igor K. [1 ]
Gelfond, Nikolay V. [1 ]
Morozova, Natalia B. [1 ]
Nizard, Harry [2 ]
机构：
[1] Russian Acad Sci, Nikolaev Inst Inorgan Chem, Siberian Branch, Novosibirsk 630090, Russia
[2] EADS Corp Res Headquarters, D-81663 Munich, Germany
来源：
CHEMICAL VAPOR DEPOSITION | 2007年 / 13卷 / 11期
关键词：
carbon contamination; metal beta-diketonates; MOCVD; platinum group metals; structural change; superficial layer;
D O I：
10.1002/cvde.200706602
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Rhodium, palladium, iridium, and platinum are deposited by means of metal-organic (MO)CVD using metal beta-diketonates as precursors. Under some conditions, the microstructure of the deposited metals changes from compact to columnar. The potential causes of structural changes are investigated and a mechanism of contamination is proposed, based on the observation of growth singularities. Several Rh, Pd, It, and Pt coatings are analyzed using scanning electron microscopy (SEM), transmission electron microscopy (TEM), high-resolution (HR)TEM, energy dispersive X-ray (EDX), and Gratan(TM) image filter (GIF) in order to observe composition, structure, and to identify the source of eventual structural changes.
引用
收藏
页码：633 / 637
页数：5
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