Studies on correction accuracy of proximity effect for the pattern area density method in electron beam direct writing

This article describes the correction accuracy of the pattern area density method for 0.2 mu m rule patterning, carrying out simulation and experiments. To enhance the mu m correction accuracy at the boundary zone of the different pattern densities, a novel technique using the gradient vectors of the pattern density is proposed and its capability for sub-0.15-mu m pattern fabrication is demonstrated. (C) 1996 American Vacuum Society.