Photoelectrochemical study of influence factors on corrosion resistance of cupronickel B30 in simulated water

被引:0
作者
Xu Qun-Jie [1 ]
Wan Zong-Yue
Yin Ren-He
Zhu Lue-Jun
Cao Wei-Min
Zhou Guo-Ding
Lin Chang-Jian
机构
[1] Shanghai Univ Elect Power, Dept Environm Engn, Key Lab State Power Corp China, Shanghai 200090, Peoples R China
[2] Shanghai Univ, Dept Chem, Shanghai 200444, Peoples R China
[3] Xiamen Univ, State Key Lab Solid Surface Phys Chem, Xiamen 361005, Peoples R China
关键词
cupronickel alloy; simulated water; photoelectrochemistry; corrosion;
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Influence factors on semiconduction properties of oxide films on a cupronickel electrode in the simulated water was studied by cyclic voltammetry and photocurrent response method. The cupronickel electrode showed p-type photoresponse, which came from CU2O layer on its surface. The photoresponse changed to n-type in the simulated water. The transition from p-type to n-type might be related to the doping of Cl- and SO42- anions into CU2O film. It did not show n-type photoresponse when the cupronickel electrode was immersed in the simulated water containing some sulfide. It was shown that the degree of corrosion increased with the concentration of these anions and temperature. In addition, as the pH increased between 7 and 9, the corrosion resistance of B30 was enhanced, while it lowered as the pH was beyond 9.
引用
收藏
页码:1981 / 1986
页数:6
相关论文
共 21 条