Near-infrared reflection from periodically aluminium-doped zinc oxide thin films

被引:41
作者
Okuhara, Yoshiki [1 ]
Kato, Takeharu [1 ]
Matsubara, Hideaki [1 ]
Isu, Norifumi [2 ]
Takata, Masasuke [3 ]
机构
[1] Japan Fine Ceram Ctr, Atsuta Ku, Aichi 4568587, Japan
[2] INAX Corp, Aichi 4798588, Japan
[3] Nagaoka Univ Technol, Dept Elect Engn, Niigata 9402188, Japan
关键词
Transparent conductive oxides; Al-doped ZnO; Reactive magnetron sputtering; Heat shielding; Multilayer; LOW-EMISSIVITY COATINGS; TRANSPARENT CONDUCTING OXIDES; OPTICAL-PROPERTIES; SIMULTANEOUS RF; DC-EXCITATION; MAGNETRON; ZNO; DURABILITY;
D O I
10.1016/j.tsf.2010.11.007
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Multilayers of aluminium-doped zinc oxide (Al:ZnO) as a heat-reflection material were prepared by a reactive sputtering method with intermittent Al doping or Al content modulation. A drop in the refractive indices n around the plasma wavelength lambda(p) of 1456 nm for the optimally-doped Al:ZnO layers formed the periodic distribution of n in the multilayers. The periodic n provided selective reflection of approximately 60% under lambda(p) and shielded near-infrared solar radiation containing high energy, which was impossible to be reflected from the Al:ZnO monolayer. The selective reflection was accompanied by infrared reflection above lambda(p), low emissivity and no subsequent visible reflection, which allowed the multilayers to achieve compatibility between the solar heat gain coefficient of 0.6 and the visible transmittance of nearly 80%. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:2280 / 2286
页数:7
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