AFM: A valid reference tool?

被引:11
作者
Marchman, HM [1 ]
Dunham, N [1 ]
机构
[1] Texas Instruments Inc, Dallas, TX 75243 USA
来源
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XII | 1998年 / 3332卷
关键词
D O I
10.1117/12.308718
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
To first order, the use of AFM as a reference tool potentially offers a large improvement over previous techniques for matching and calibration of on-line CD-SEMs. However, the utility of this approach depends on the validity of the assumption that AFM precision and accuracy are relatively constant with sample type. A full-factorial design using analysis of variations (ANOVA) has been employed in order to gauge the precision of a non-contact mode CD AFM over multiple sample types and instrument conditions. The effects of material layer, pattern geometry, feature shape, and tip size on AFM precision will be presented.
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页码:2 / 9
页数:8
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