Tetrahedral amorphous carbon films by filtered cathodic vacuum-arc deposition for air-bearing-surface overcoat

被引:13
|
作者
Inaba, H
Furusawa, K
Hirano, S
Sasaki, S
Todoroki, S
Yamasaka, M
Endou, M
机构
[1] Hitachi Ltd, Prod Engn Res Lab, Totsuka Ku, Yokohama, Kanagawa 2440817, Japan
[2] Hitachi Ltd, Data Storage Syst Div, Kanagawa 2568510, Japan
关键词
air-bearing-surface overcoat; filtered cathodic vacuum arc; tetrahedral amorphous carbon; ion; plasma;
D O I
10.1143/JJAP.42.2824
中图分类号
O59 [应用物理学];
学科分类号
摘要
Measures were taken to reduce the generation of particles during the fabrication of tetrahedral amorphous carbon (ta-C) film by the double-bend filtered cathodic vacuum-arc (FCVA) method. Specifically, the use of physical and electrical filters in the plasma path reduced the number of micron-order particles that arrive at the substrate to about 1/100 the usual value. In addition, an experiment was performed to evaluate the density of pinholes of both the ta-C film fabricated by FCVA method with these filters and a hydrogenerated amorphous carbon (a-C:H) film fabricated by chemical vapor deposition (CVD) method. The results of this experiment revealed that the density of pinholes generated for a film thickness of about 3 nm was 2 x 10(3)/cm(2) for the ta-C film compared to 8 x 10(3)/cm(2) for the a-C:H film, indicating that ta-C film is much denser than a-C:H film. Furthermore, an environmental test under high-temperature and high-humidity conditions showed that ta-C film is superior to a-C:H film in terms of corrosion resistance.
引用
收藏
页码:2824 / 2828
页数:5
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