Improvement of GaN-based light-emitting diode by indium-tin-oxide transparent electrode and vertical electrode

被引:24
作者
Kim, SJ [1 ]
机构
[1] Itswell Co Ltd, Photon Devices Res Lab, Chungbuk 363911, South Korea
关键词
GaN; III-V light-emitting diode (LED); indium-tin-oxide (ITO); metal-organic chemical vapor deposition;
D O I
10.1109/LPT.2005.851982
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A sapphire-etched vertical-electrode nitride semiconductor (SEVENS) light-emitting diode (LED) is fabricated by means of a selective chemical wet-etching technique. The SEVENS-LED formed on sapphire substrate exhibits excellent device performance compared to a conventional NiAu lateral-electrode (LE) GaN-based LED formed on the same sapphire substrate. The integral light-output power of SEVENS-LED is similar to 7 mW, which is 1.75 times stronger than that of the conventional NiAu LE-LED (similar to 4 mW). The external quantum efficiency of SEVENS-LED is estimated to be approximately 13%.
引用
收藏
页码:1617 / 1619
页数:3
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