Reduction of oxide layer on various metal surfaces by atomic hydrogen treatment

被引:17
作者
Izumi, Akira [1 ]
Ueno, Tomoya [1 ]
Miyazaki, Yasuo [1 ]
Oizumi, Hiroaki [1 ,2 ]
Nishiyama, Iwao [2 ]
机构
[1] Kyushu Inst Technol, Fukuoka 8048550, Japan
[2] Assoc Super Adv Elect Technol, Kanagawa 2430198, Japan
关键词
Atomic hydrogen; Cleaning; Hot-wire; Metal oxides; Reduction;
D O I
10.1016/j.tsf.2007.06.094
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The reduction of various metallic oxides was examined. Atomic hydrogen generated on a heated tungsten catalyzer was used for reduction. It was found that Cu, Ru, Nb, Mo, Rh, Pd, Ir and Pt oxides can be reduced by irradiation with atomic hydrogen. The activation energy for oxide removal was examined and it was found that the values were very small, 10(-2) to 10(-4) eV. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:853 / 855
页数:3
相关论文
共 6 条
[1]   Design and performance of capping layers for extreme-ultraviolet multilayer mirrors [J].
Bajt, SA ;
Chapman, HN ;
Nguyen, N ;
Alameda, J ;
Robinson, JC ;
Malinowski, M ;
Gullikson, E ;
Aquila, A ;
Tarrio, C ;
Grantham, S .
APPLIED OPTICS, 2003, 42 (28) :5750-5758
[2]   (001)-textured Cu2S thin films deposited by RF reactive sputtering [J].
He, YB ;
Kriegseis, W ;
Bläsing, J ;
Polity, A ;
Krämer, T ;
Hasselkamp, D ;
Meyer, BK ;
Hardt, M ;
Krost, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (7A) :4630-4634
[3]  
Huff HR, 2005, AIP CONF PROC, V788, P39, DOI 10.1063/1.2062937
[4]  
IZUMI A, 2005, ECS T, V1, P327
[5]   Reduction of oxide layer on Ru surface by atomic-hydrogen treatment [J].
Nishiyama, I ;
Oizumi, H ;
Motai, K ;
Izumi, A ;
Ueno, T ;
Akiyama, H ;
Namiki, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06) :3129-3131
[6]   Contamination removal from EUV multilayer using atomic hydrogen generated by heated catalyzer [J].
Oizumi, H ;
Yamanashi, H ;
Nishiyama, I ;
Hashimoto, K ;
Ohsono, S ;
Masuda, A ;
Izumi, A ;
Matsumura, H .
EMERGING LITHOGRAPHIC TECHNOLOGIES IX, PTS 1 AND 2, 2005, 5751 :1147-1154