Subregional slicing method to increase three-dimensional nanofabrication efficiency in two-photon polymerization

被引:76
作者
Park, SH
Lee, SH
Yang, DY [1 ]
Kong, HJ
Lee, KS
机构
[1] Korea Adv Inst Sci & Technol, Dept Mech Engn, Taejon 305701, South Korea
[2] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[3] Hannam Univ, Dept Polymer Sci & Engn, Taejon 306791, South Korea
关键词
D O I
10.1063/1.2103393
中图分类号
O59 [应用物理学];
学科分类号
摘要
A subregional slicing method (SSM) is proposed to increase the nanofabrication efficiency of a nanostereolithography (NSL) process based on two-photon polymerization (TPP). The NSL process can be used to fabricate three-dimensional (3D) microstructures via the accumulation of layers of uniform thickness; hence, the precision of the final 3D microstructure depends on the layer thickness. The use of a uniform layer thickness means that, to fabricate a precise microstructure, a large number of thin slices is inevitably required, leading to long processing times. In the SSM proposed here, however, the 3D microstructure is divided into several subregions on the basis of the geometric slope, and then each of these subregions is uniformly sliced with a layer thickness determined by the geometric slope characteristics of each subregion. Subregions with gentle slopes are sliced with thin layer thicknesses, whereas subregions with steep slopes are sliced with thick layer thicknesses. Here, we describe the procedure of the SSM based on TPP, and discuss the fabrication efficiency of the method through the fabrication of a 3D microstructure. (C) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
相关论文
共 17 条
  • [1] Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography
    Austin, MD
    Ge, HX
    Wu, W
    Li, MT
    Yu, ZN
    Wasserman, D
    Lyon, SA
    Chou, SY
    [J]. APPLIED PHYSICS LETTERS, 2004, 84 (26) : 5299 - 5301
  • [2] Stamps for submicrometer soft lithography fabricated by capillary force lithography
    Bruinink, CM
    Péter, M
    de Boer, M
    Kuipers, L
    Huskens, J
    Reinhoudt, DN
    [J]. ADVANCED MATERIALS, 2004, 16 (13) : 1086 - +
  • [3] Imprint lithography with 25-nanometer resolution
    Chou, SY
    Krauss, PR
    Renstrom, PJ
    [J]. SCIENCE, 1996, 272 (5258) : 85 - 87
  • [4] Two-photon three-dimensional microfabrication of poly(dimethylsiloxane) elastomers
    Coenjarts, CA
    Ober, CK
    [J]. CHEMISTRY OF MATERIALS, 2004, 16 (26) : 5556 - 5558
  • [5] Two-photon polymerization of metal ions doped acrylate monomers and oligomers for three-dimensional structure fabrication
    Duan, XM
    Sun, HB
    Kaneko, K
    Kawata, S
    [J]. THIN SOLID FILMS, 2004, 453 : 518 - 521
  • [6] ACCESSING 3D MEMORY INFORMATION BY MEANS OF NONLINEAR ABSORPTION
    DVORNIKOV, AS
    RENTZEPIS, PM
    [J]. OPTICS COMMUNICATIONS, 1995, 119 (3-4) : 341 - 346
  • [7] JACOBS PF, 1996, STEREOLITHOGRAPHY OT, P123
  • [8] Contour offset algorithm for precise patterning in two-photon polymerization
    Lim, TW
    Park, SH
    Yang, DY
    [J]. MICROELECTRONIC ENGINEERING, 2005, 77 (3-4) : 382 - 388
  • [9] Park SH, 2005, POLYM-KOREA, V29, P146
  • [10] Park SH, 2004, B KOREAN CHEM SOC, V25, P1119