Millimeter-wave permittivity measurement of deposited dielectric films using the spherical open resonator

被引：12

作者：

Dudorov, SN ^{[1
]}

Lioubtchenko, DV ^{[1
]}

Mallat, JA ^{[1
]}

Räisänen, AV ^{[1
]}

机构：

[1] Helsinki Univ Technol, SMARAD, Radio Lab, MilliLab, FI-02015 Helsinki, TKK, Finland

来源：

IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS | 2005年 / 15卷 / 09期

关键词：

dielectric constant; millimeter wave; open resonator; thin film;

D O I：

10.1109/LMWC.2005.855370

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A differential method using the spherical open resonator is developed for permittivity measurement of a thin dielectric film on an optically dense substrate. It is based on a measurement of the resonant frequency shift due to the thin film on the substrate. The accuracy of the method is demonstrated to be about 4% for a 5.6-mu m photoresist film at 142 GHz.

引用

页码：564 / 566

页数：3

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